Atomically Resolved Defect-Engineering Scattering Potential in 2D Semiconductors
Source abstract
Abstract
Engineering atomic-scale defects has become an important strategy for the future application of transition metal dichalcogenide (TMD) materials in next-generation electronic technologies. Thus, providing an atomic understanding of the electron-defect interactions and supporting defect engineering development to improve carrier transport is crucial to future TMDs technologies. In this work, we utilize low-temperature scanning tunneling microscopy/spectroscopy (LT-STM/S) to elicit how distinct types of defects bring forth scattering potential engineering based on intervalley quantum quasiparticle interference (QPI) in TMDs. Furthermore, quantifying the energy-dependent phase variation of the QPI standing wave reveals the detailed electron-defect interaction between the substitution-induced scattering potential and the carrier transport mechanism. By exploring the intrinsic electronic behavior of atomic-level defects to further understand how defects affect carrier transport in low-dimensional semiconductors, we offer potential technological applications that may contribute to the future expansion of TMDs.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: 2D Materials and Applications · Graphene research and applications · MXene and MAX Phase Materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Graduate School of Advanced Technology, National Taiwan University, Taipei 10617, Taiwan
Department of Physics, National Taiwan University, Taipei 10617, Taiwan
Taiwan Semiconductor Manufacturing Company, Hsinchu 30078, Taiwan
Institute of Physics, Academia Sinica, Taipei 115201, Taiwan
Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 106319, Taiwan
Funding
National Taiwan University · National Science and Technology Council · Ministry of Education, Taiwan
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