journal article·2024-08-06

All-2D-Materials Subthreshold-Free Field-Effect Transistor with Near-Ideal Switching Slope

Jiayang Hu, Hanxi Li, Anzhe Chen, Yishu Zhang, Hailiang Wang, Yu Fu, Xin Zhou, Kian Ping Loh, Yu Kang, Jian Chai, Chenhao Wang, Jiachao Zhou, Jialei Miao, Yuda Zhao, Shuai Zhong, Rong Zhao, Kaihui Liu, Yang Xu, Bin Yu

ACS Nano· Volume 18· Issue 31
Publisher page

Abstract

The Boltzmann Tyranny, set by thermionic statistics, dictates the lower limit of switching slope (SS) of a MOSFET to be 60 mV/dec, the fundamental barrier for low-dissipative electronics. The large SS leads to nonscalable voltage, significant leakage, and power consumption, particularly at short channels, making transistor scaling an intimidating challenge. In recent decades, an array of steep-slope transistors has been proposed; none is close to an ideal switch with ultimately abrupt switching (SS ∼ 0 mV/dec) between the binary logic states. We demonstrated an all-2D-materials van-der-Waals-heterostructure (vdW)-based FET that exhibits ultrasteep switching (0.33 mV/dec), a large on/off current ratio (∼10 7 ), and an ultralow off current (∼0.1 pA). The “Subthreshold-Free” operation achieved by the collective behavior of functional materials enables FET switching directly from the OFF-state to the ON-state with entirely eliminated subthreshold region, behaving as the ideal logic switch. Two-inch wafer-scale device fabrication is demonstrated. Boosted by device innovation and emerging materials, the research presents an advancement in achieving the “beyond-Boltzmann” transistors, overcoming one of the CMOS electronics’ most infamous technology barriers that have plagued the research community for decades.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Advancements in Semiconductor Devices and Circuit Design · Ferroelectric and Negative Capacitance Devices · Graphene research and applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

College of Integrated Circuits, Zhejiang University, Hangzhou, Zhejiang 311200, China

ZJU-Hangzhou Global Scientific and Technological Innovation Center, Hangzhou, Zhejiang 311200, China

State Key Laboratory for Mesoscopic Physics, Frontiers Science Center for Nano-optoelectronics, School of Physics, Peking University, Beijing 100871, China

Department of Chemistry, National University of Singapore, Singapore 117543, Singapore

School of Materials Science and Engineering, Zhejiang University, Hangzhou, Zhejiang 310027, China

Department of Precision Instruments, Tsinghua University, Beijing 100084, China

Funding

Fundamental Research Funds for the Central Universities · National Natural Science Foundation of China · Excellent Young Scientists Fund · Natural Science Foundation of Zhejiang Province

References (60)

Show source-provided references
1. 10.1038/nature1067910.1038/nature10679 ↗
2. 10.1038/526051a10.1038/526051a ↗
3. IEEE International Roadmap for Devices and Systems, 2021. https://irds.ieee.org/ (accessed 2021).
4. 10.1038/natrevmats.2016.5210.1038/natrevmats.2016.52 ↗
5. 10.1021/nl500635510.1021/nl5006355 ↗
6. 10.1038/nature1538710.1038/nature15387 ↗
7. 10.1002/adma.20200535310.1002/adma.202005353 ↗
8. 10.1002/aelm.20200025810.1002/aelm.202000258 ↗
9. 10.1126/science.aap919510.1126/science.aap9195 ↗
10. 10.1021/acs.nanolett.0c0465710.1021/acs.nanolett.0c04657 ↗
11. 10.1038/ncomms881210.1038/ncomms8812 ↗
12. 10.1038/s41467-020-20051-010.1038/s41467-020-20051-0 ↗
13. 10.1002/advs.20210020810.1002/advs.202100208 ↗
14. 10.1109/LED.2016.256666110.1109/LED.2016.2566661 ↗
15. 10.1002/adfm.20170486210.1002/adfm.201704862 ↗
16. 10.1109/LED.2014.232721910.1109/LED.2014.2327219 ↗
17. 10.1002/advs.20210443910.1002/advs.202104439 ↗
18. 10.1002/adfm.20200781010.1002/adfm.202007810 ↗
19. 10.1038/s41586-021-03339-z10.1038/s41586-021-03339-z ↗
20. 10.1038/nnano.2014.20710.1038/nnano.2014.207 ↗
21. 10.1088/2053-1583/3/3/03500410.1088/2053-1583/3/3/035004 ↗
22. 10.1038/s41928-020-00473-w10.1038/s41928-020-00473-w ↗
23. 10.1021/nl504957p10.1021/nl504957p ↗
24. 10.1021/nl501531610.1021/nl5015316 ↗
25. 10.1016/j.nanoen.2020.10447210.1016/j.nanoen.2020.104472 ↗
26. 10.1002/aelm.20170060810.1002/aelm.201700608 ↗
27. 10.1002/adfm.20140130410.1002/adfm.201401304 ↗
28. 10.1109/TED.2021.307602910.1109/TED.2021.3076029 ↗
29. 10.1039/D2NR06547A10.1039/D2NR06547A ↗
30. 10.1002/smll.20200676010.1002/smll.202006760 ↗
31. 10.1002/smll.20210625310.1002/smll.202106253 ↗
32. 10.1002/adfm.20150477110.1002/adfm.201504771 ↗
33. 10.1063/1.474980910.1063/1.4749809 ↗
34. 10.1038/nmat410510.1038/nmat4105 ↗
35. 10.1109/TED.2021.309503310.1109/TED.2021.3095033 ↗
36. 10.1039/C8FD00117K10.1039/C8FD00117K ↗
37. 10.1038/s41598-020-73254-210.1038/s41598-020-73254-2 ↗
38. 10.1038/natrevmats.2016.4210.1038/natrevmats.2016.42 ↗
39. 10.1002/aelm.20220110410.1002/aelm.202201104 ↗
40. 10.1038/s41467-022-28628-710.1038/s41467-022-28628-7 ↗
41. 10.1016/j.scib.2023.06.03710.1016/j.scib.2023.06.037 ↗
42. 10.1038/s41563-022-01361-810.1038/s41563-022-01361-8 ↗
43. 10.1002/advs.20170008710.1002/advs.201700087 ↗
44. 10.1021/accountsmr.2c0006110.1021/accountsmr.2c00061 ↗
45. 10.1038/s41928-022-00911-x10.1038/s41928-022-00911-x ↗
46. 10.1038/s41467-020-20732-w10.1038/s41467-020-20732-w ↗
47. 10.1038/s41699-020-0142-210.1038/s41699-020-0142-2 ↗
48. Noguchi, M.; Kim, S.; Yokoyama, M.; Ji, S.; Ichikawa, O.; Osada, T.; Hata, M.; Takenaka, M.; Takagi, S. High Ion/Ioff and low subthreshold slope planar-type InGaAs Tunnel FETs with Zn-diffused source junctions. In IEEE International Electron Devices Meeting (IEDM); IEEE, 2013; pp 28.1.1–28.1.4.10.1109/IEDM.2013.6724707 ↗
49. 10.1021/acsami.8b1139610.1021/acsami.8b11396 ↗
50. 10.1021/acs.nanolett.7b0158410.1021/acs.nanolett.7b01584 ↗
51. 10.1038/s41467-019-10738-410.1038/s41467-019-10738-4 ↗
52. 10.1109/TED.2019.293418110.1109/TED.2019.2934181 ↗
53. Yu, Z. H.; Wang, H. C.; Li, W. S.; Xu, S.; Song, X. F.; Wang, S. X.; Wang, P.; Zhou, P.; Shi, Y.; Chai, Y. Negative Capacitance 2D MoS2 Transistors with Sub-60mV/dec Subthreshold Swing over 6 Orders, 250 μA/μm current density, and Nearly-Hysteresis-Free. In 63rd IEEE Annual International Electron Devices Meeting (IEDM), 2017; pp 23.6.1–23.6.4.10.1109/IEDM.2017.8268448 ↗
54. 10.1002/adfm.20200385910.1002/adfm.202003859 ↗
55. 10.1038/s41598-017-00359-610.1038/s41598-017-00359-6 ↗
56. 10.1109/JEDS.2018.285685310.1109/JEDS.2018.2856853 ↗
57. Park, J.; Lee, D.; Yoo, J.; Hwang, H. NbO2 based threshold switch device with high operating temperature (>85°C) for steep-slope MOSFET (∼2mV/dec) with ultra-low voltage operation and improved delay time. In 63rd IEEE Annual International Electron Devices Meeting (IEDM); IEEE, 2017; pp 23.7.1–23.7.4.10.1109/IEDM.2017.8268449 ↗
58. Shukla, N.; Grisafe, B.; Ghosh, R. K.; Jao, N.; Aziz, A.; Frougier, J.; Jerry, M.; Sonde, S.; Rouvimov, S.; Orlova, T. Ag/HfO2 based Threshold Switch with Extreme Non-Linearity for Unipolar Cross-Point Memory and Steep-slope Phase-FETs. In 62nd Annual IEEE International Electron Devices Meeting (IEDM), 2016; pp 34.6.1–34.6.4.10.1109/IEDM.2016.7838542 ↗
59. Song, J.; Park, J.; Moon, K.; Woo, J.; Lim, S.; Yoo, J.; Lee, D.; Hwang, H. Monolithic Integration of AgTe/TiO2 based Threshold Switching Device with TiN liner for Steep Slope Field-Effect Transistors. In 62nd Annual IEEE International Electron Devices Meeting (IEDM); IEEE, 2016; pp 25.3.1–25.3.4.10.1109/IEDM.2016.7838478 ↗
60. 10.1126/sciadv.abf874410.1126/sciadv.abf8744 ↗