Towards Artificial Intelligence Hardware With 3D Integrated Ferroelectric Transistors
Source abstract
Abstract
ABSTRACT The increasing energy and bandwidth demand of modern AI workloads highlight the need for hardware that mitigates the data‐movement bottleneck of von Neumann architectures. Compute‐in‐memory and neuromorphic systems offer a compelling solution, yet reliable multi‐tier 3D integration of analog synaptic devices remains challenging. Here, we report a monolithic 3D (M3D) integration platform that vertically stacks In‐Ga‐Zn‐O (IGZO) access transistors and Hf 0.5 Zr 0.5 O (HZO)‐based ferroelectric transistors to realize compact, energy‐efficient neuromorphic hardware. Two‐tier and four‐tier IGZO/ferroelectric field effect transistors (FeFET) architectures were fabricated with excellent structural integrity, uniform elemental profiles, and preserved orthorhombic HZO ferroelectricity across all tiers. The devices exhibit reproducible switching, >10‐year retention, endurance up to 10 1 1 cycles, and stable multilevel conductance states suitable for synaptic computing. Mapping device characteristics to a convolutional neural network (CNN) for Canadian Institute for Advanced Research (CIFAR‐10) inference yields 95.0% (tier‐2) and 95.5% (tier‐4) accuracy, approaching the 96.1% software baseline. Analog‐domain convolution was further demonstrated by encoding kernel weights into FeFET conductance states for edge‐aware image processing. These results establish M3D‐integrated FeFETs as a scalable and reliable platform for next‐generation compute‐in‐memory and neuromorphic vision applications.
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Research context
OpenAlex topics: Ferroelectric and Negative Capacitance Devices · Advanced Memory and Neural Computing · Advanced Sensor and Energy Harvesting Materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Research Laboratory of Electronics Massachusetts Institute of Technology Cambridge Massachusetts USA
SKKU Advanced Institute of Nanotechnology (SAINT) Sungkyunkwan University Suwon South Korea
Department of Nano Science and Technology Sungkyunkwan University Suwon South Korea
School of Mechanical Engineering Sungkyunkwan University (SKKU) Suwon‐si Gyeonggi‐do South Korea
Department of Semiconductor Convergence Engineering Sungkyunkwan University Suwon South Korea
References (41)
Show source-provided references
1. 10.1038/s41467-024-44766-610.1038/s41467-024-44766-6 ↗
2. 10.1002/advs.20240787010.1002/advs.202407870 ↗
3. 10.1002/aelm.20230083910.1002/aelm.202300839 ↗
4. 10.1109/TVLSI.2024.346714810.1109/TVLSI.2024.3467148 ↗
5. 10.1038/s41467-020-15159-210.1038/s41467-020-15159-2 ↗
6. 10.1002/adma.20241992710.1002/adma.202419927 ↗
7. 10.1038/s41565‐020‐0655‐z10.1038/s41565‐020‐0655‐z ↗
8. 10.3390/s2306311810.3390/s23063118 ↗
9. S. J.Ahn Y. G.Song andD.Cho “Future Technology Outlook on DRAM/Flash Memories for More Moore and More than Moore ” in2025 IEEE International Memory Workshop (IMW)(IEEE 2025) 1–4.10.1109/IMW61990.2025.11026954 ↗
10. 10.1002/adma.20230795110.1002/adma.202307951 ↗
11. 10.1002/adma.20150586510.1002/adma.201505865 ↗
12. 10.1002/advs.20210384210.1002/advs.202103842 ↗
13. 10.1038/s41565-023-01361-y10.1038/s41565-023-01361-y ↗
14. 10.1038/s41578-022-00431-210.1038/s41578-022-00431-2 ↗
15. 10.1021/acsnano.5c1409510.1021/acsnano.5c14095 ↗
16. 10.1038/s41928-020-00492-710.1038/s41928-020-00492-7 ↗
17. 10.1002/adfm.20230465710.1002/adfm.202304657 ↗
18. 10.1038/s41563-022-01422-y10.1038/s41563-022-01422-y ↗
19. 10.1109/LED.2018.284657010.1109/LED.2018.2846570 ↗
20. C.‐Y.Liao K.‐Y.Hsiang andZ.‐F.Lou “Endurance>10 11 Cycling of 3D GAA Nanosheet Ferroelectric FET with Stacked HfZrO 2 to Homogenize Corner Field Toward Mitigate Dead Zone for High‐density eNVM ” in2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)(IEEE 2022) 1–2.10.1109/VLSITechnologyandCir46769.2022.9830345 ↗
21. 10.1038/s41565-023-01399-y10.1038/s41565-023-01399-y ↗
22. 10.1038/s41928-024-01175-310.1038/s41928-024-01175-3 ↗
23. 10.1145/352976010.1145/3529760 ↗
24. J.Sharda P.‐K.Hsu andS.Yu “Accelerator Design Using 3D Stacked Capacitorless DRAM for Large Language Models ” in2024 IEEE 6th International Conference on AI Circuits and Systems (AICAS)(IEEE 2024) 487–491 https://doi.org/10.1109/AICAS59952.2024.10595901.10.1109/AICAS59952.2024.10595901 ↗
25. 10.1038/s44287-025-00162-w10.1038/s44287-025-00162-w ↗
26. 10.1039/D1NA00882J10.1039/D1NA00882J ↗
27. 10.1002/advs.20250474610.1002/advs.202504746 ↗
28. 10.1002/advs.20251096110.1002/advs.202510961 ↗
29. 10.1038/s41928-024-01188-y10.1038/s41928-024-01188-y ↗
30. Z.Zheng C.Sun andL.Jiao “Boosting the Memory Window of the BEOL‐compatible MFMIS Ferroelectric/Anti‐ferroelectric FETs by Charge Injection ” in2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)(IEEE 2022) 389–390 https://doi.org/10.1109/VLSITechnologyandCir46769.2022.9830466.10.1109/VLSITechnologyandCir46769.2022.9830466 ↗
31. 10.1002/adfm.20160318210.1002/adfm.201603182 ↗
32. 10.1126/sciadv.adp017410.1126/sciadv.adp0174 ↗
33. 10.1038/s41467-023-42110-y10.1038/s41467-023-42110-y ↗
34. 10.1126/sciadv.abe134110.1126/sciadv.abe1341 ↗
35. 10.1038/s41565-023-01375-610.1038/s41565-023-01375-6 ↗
36. 10.1038/s41586-024-08236-910.1038/s41586-024-08236-9 ↗
37. 10.1038/s41586-024-07438-510.1038/s41586-024-07438-5 ↗
38. 10.1038/s41586-024-07406-z10.1038/s41586-024-07406-z ↗
39. 10.1002/advs.20240125010.1002/advs.202401250 ↗
40. 10.1038/srep3199110.1038/srep31991 ↗
41. 10.1038/s41467-024-46878-510.1038/s41467-024-46878-5 ↗