Source abstract
Abstract
Abstract High dielectric constant materials are of particular current interests as indispensable components in transistors, capacitors, etc. In this context, there are emerging trends to exploit defect engineering in dielectric ceramics for enhancing the performance. However, demonstrations of similar high dielectric performance in integration‐compatible crystalline films are rare. Herein, such a breakthrough via the functionalization of donor–acceptor dipoles by compositional tuning in GaCu codoped ZnO films is reported. The dielectric constant reaches ~200 at 1 kHz and the optical transmittance in visible light reaches ~80%. Importantly, by analyzing the impedance spectroscopy data, prominent relaxation mechanisms in correlation with the dipole properties, enabling consistent explanations of the dielectric constant as a function of frequency are discriminated. The atomistic nature of the dipoles is revealed by the systematic X‐ray spectroscopy analysis. Spectacularly, similar trends for the dielectric properties are observed, while synthesizing samples by pulsed laser deposition and ion implantation, indicating the general character of the phenomena.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Dielectric properties of ceramics · Ferroelectric and Piezoelectric Materials · ZnO doping and properties
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Physics The University of Hong Kong Hong Kong 999077 P. R. China
Polymer Composite Group (PCG) Physics Division PINSTECH P. O. Nilore Islamabad 45650 Pakistan
Electronic and Magnetic Materials Group (EMMG) Physics Division PINSTECH P. O. Nilore Islamabad 45650 Pakistan
Synchrotron‐Light for Experimental Science and Applications in the Middle East (SESAME) Allan 19252 Jordan
Helmholtz‐Zentrum Dresden‐Rossendorf Institute of Ion Beam Physics and Materials Research Bautzner Landstrasse 400 01328 Dresden Germany
CAS Key Lab of Inorganic Functional Materials and Devices Shanghai Institute of Ceramics Chinese Academy of Sciences Shanghai 200050 China
Department of Physics University of Oslo P.O. Box 1048 Blindern Oslo 0316 Norway
References (28)
Show source-provided references
2. Y. C.Lu W. C.Hong X. L.Du Y. H.Zhang Z. X.Mei US Patent No. 11322622 2021.
7. Natarajan S. · 2014
21. Moulder J. F. · 1992