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journal article·2018-05Open access

Large Photothermal Effect in Sub‐40 nm h‐BN Nanostructures Patterned Via High‐Resolution Ion Beam

Josué J. López, Antonio Ambrosio, Siyuan Dai, Chuong Huynh, David C. Bell, Xiao Lin, Nicholas Rivera, Shengxi Huang, Qiong Ma, Soeren Eyhusen, Ido E. Kaminer, Kenji Watanabe, Takashi Taniguchi, Jing Kong, Dimitri N. Basov, Pablo Jarillo‐Herrero, Marin Soljačić

Small· Volume 14· Issue 22
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Abstract

Abstract The controlled nanoscale patterning of 2D materials is a promising approach for engineering the optoelectronic, thermal, and mechanical properties of these materials to achieve novel functionalities and devices. Herein, high‐resolution patterning of hexagonal boron nitride (h‐BN) is demonstrated via both helium and neon ion beams and an optimal dosage range for both ions that serve as a baseline for insulating 2D materials is identified. Through this nanofabrication approach, a grating with a 35 nm pitch, individual structure sizes down to 20 nm, and additional nanostructures created by patterning crystal step edges are demonstrated. Raman spectroscopy is used to study the defects induced by the ion beam patterning and is correlated to scanning probe microscopy. Photothermal and scanning near‐field optical microscopy measure the resulting near‐field absorption and scattering of the nanostructures. These measurements reveal a large photothermal expansion of nanostructured h‐BN that is dependent on the height to width aspect ratio of the nanostructures. This effect is attributed to the large anisotropy of the thermal expansion coefficients of h‐BN and the nanostructuring implemented. The photothermal expansion should be present in other van der Waals materials with large anisotropy and can lead to applications such as nanomechanical switches driven by light.
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Research context

NanomaterialsElectronic materials

OpenAlex topics: Diamond and Carbon-based Materials Research · Advancements in Semiconductor Devices and Circuit Design · Thermal properties of materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Electrical Engineering and Computer Science Massachusetts Institute of Technology Cambridge MA 02139 USA

Center for Nanoscale Systems Harvard University Cambridge MA 02138 USA

Department of Physics University of California San Diego La Jolla CA 92093 USA

Carl Zeiss Microscopy LLC Peabody MA 01960 USA

Division of Physics and Applied Physics School of Physical and Mathematical Sciences Nanyang Technological University Singapore 637371 Singapore

Department of Physics Massachusetts Institute of Technology Cambridge MA 02139 USA

Department of Electrical Engineering The Pennsylvania State University University Park PA 16802 USA

National Institute for Materials Science Namiki 1‐1 Tsukuba Ibaraki 305‐0044 Japan

Department of Physics Columbia University New York NY 10027 USA

Funding

Ministry of Education, Culture, Sports, Science and Technology · Japan Society for the Promotion of Science · U.S. Department of Energy · Air Force Office of Scientific Research · National Science Foundation · China Scholarship Council · FP7 Ideas: European Research Council · Army Research Office · Harvard University · Gordon and Betty Moore Foundation

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