Cover Picture: Nanometer‐Scale Modification and Welding of Silicon and Metallic Nanowires with a High‐Intensity Electron Beam (Small 12/2005)

The cover picture shows an artificially colored transmission electron microscopy image of a 39‐nm‐diameter silicon nanowire, where the word “small” has been sculpted on the nanowire by a high‐intensity electron beam. We demonstrate that an intense electron beam can be applied to create holes, gaps, and other patterns of atomic and nanometer dimensions on a single nanowire. The electron beam can also be used to weld individual nanowires, forming metal–metal or metal–semiconductor junctions. For more information, please read the Full Paper “Nanometer‐Scale Modification and Welding of Silicon and Metallic Nanowires with a High‐Intensity Electron Beam” by S. Y. Xu and co‐workers on page 1221 ff.