MoTe2 CMOS Inverters: Controllable P‐ and N‐Type Conversion of MoTe2 via Oxide Interfacial Layer for Logic Circuits (Small 28/2019)
Source abstract
Abstract
In article number 1901772, Jong-Hyun Ahn and co-workers demonstrate the use of ultrathin Al2O3 layer as a selective-surface dopant for the fabrication of complementary metal-oxide-semiconductor (CMOS) inverter on single MoTe2 crystal. This surface doping approach can offer a realistic path for the realization of 2D transition-metal-dichalcogenide based efficient and ultrafast electronic-units with high-density circuit components under a low-dimensional regime.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: 2D Materials and Applications · Quantum Dots Synthesis And Properties · Chalcogenide Semiconductor Thin Films
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Affiliations
School of Electrical and Electronic Engineering Yonsei University Seoul 03722 Republic of Korea
References
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