Real‐Time Unsupervised Learning and Image Recognition via Memristive Neural Integrated Chip Based on Negative Differential Resistance of Electrochemical Metallization Cell Neuron Device
Source abstract
Abstract
Abstract Spiking neurons are essential for building energy‐efficient biomimetic spatiotemporal systems because they communicate with other neurons using sparse and binary signals. However, the achievable high density of artificial neurons having a capacitor for emulating the integrate function of biological neurons has a limit. Furthermore, a low‐voltage operation (<1.0 V) is essential for connecting with modern complementary metal‐oxide‐semiconductor‐field‐effect‐transistor‐based (C‐MOSFET—based) integrated circuits. Here, a capacitorless memristive‐neural integrated chip (MnIC) based on the negative differential resistance of the electrochemical metallization cell designed using a 28‐nm C‐MOSFET process in a foundry is reported. The fabricated MnIC exhibits extremely low‐voltage operation (<0.7 V) via the rupture dynamics of Ag filaments formed in the GeS2 chalcogenide layer, with a nonlinear increase in the action potential in a manner similar to a human sensory system. Moreover, to construct a fully‐structured spiking neural network (SNN), an oxygenated amorphous carbon‐based (α‐COx‐based) synaptic device having 32 multi‐level conductance states is designed. The designed MnIC and α‐COx‐based synaptic device demonstrate real‐time unsupervised learning via a spike‐timing‐dependent plasticity learning rule with an SNN. Using the trained SNN, the real‐time hand‐written digit image of a cell phone obtained from a live webcam is successfully classified, which suggests practical applications for brain‐like neuromorphic chips.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Advanced Memory and Neural Computing · Neural dynamics and brain function · Transition Metal Oxide Nanomaterials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Nano‐scale Semiconductor Engineering Hanyang University Seoul 04763 Republic of Korea
Department of Electronic Engineering Hanyang University Seoul 04763 Republic of Korea
SK Hynix Inc. Icheon Kyunggi‐do 17336 Republic of Korea
Advanced Semiconductor Materials and Devices Development Center Hanyang University Seoul 04763 Republic of Korea
Department of Electrical and Computer Engineering Seoul National University Seoul 08826 Republic of Korea
Funding
Samsung
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