DataVXSmallPaper
journal article·2021-09

Integrated Assembly and Photopreservation of Topographical Micropatterns (Small 37/2021)

Shuailong Zhang, Weizhen Li, Mohamed Elsayed, Jiaxi Peng, Yujie Chen, Yanfeng Zhang, Yibo Zhang, Moein Shayegannia, Wenkun Dou, Tiancong Wang, Yu Sun, Nazir P. Kherani, Steven L. Neale, Aaron R. Wheeler

Small· Volume 17· Issue 37
Publisher page
Source abstract

Abstract

Topographical Micropatterns In article number 2103702, Aaron R. Wheeler and co-workers introduce a new technique for forming permanent topographical micropatterns, relying on optoelectronic tweezers (OET) and in situ UV photopolymerization. For the first time, an OET system was used to assemble working microcapacitive circuits, and the capacity to preserve these systems in photocured resins (which can be transferred to diverse materials) opens the door for a wide range of applications.
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Electronic materials

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Affiliations

Donnelly Centre for Cellular and Biomolecular Research University of Toronto Toronto ON M5S 3E1 Canada

Department of Chemistry University of Toronto Toronto ON M5S 3H6 Canada

Institute of Biomedical Engineering University of Toronto Toronto ON M5S 3G9 Canada

James Watt School of Engineering University of Glasgow Glasgow G12 8LT UK

State Key Laboratory of Optoelectronic Materials and Technologies School of Electronics and Information Technology Sun Yat‐sen University Guangzhou 510275 China

Department of Electrical and Computer Engineering University of Toronto Toronto ON M5S 3G4 Canada

Department of Mechanical and Industrial Engineering University of Toronto Toronto M5S 3G8 Canada

Department of Materials Science and Engineering University of Toronto Toronto ON M5S 3E4 Canada

References

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