Micro‐Nano Fabrication: Fabrication of Sub‐Micrometer‐Sized MoS2 Thin‐Film Transistor by Phase Mode AFM Lithography (Small 49/2018)
Source abstract
Abstract
In article number 1803273, Lianqing Liu and co-workers propose a unique mask-free and marker-free lithography technique to fabricate a sub-micrometer-sized 2D material thin-film transistor using the phase mode of atomic force microscopy. This method does not change the chemical, physical, and electrical properties of 2D materials. It offers a flexible, easy, effective, and low-cost way to fabricate prototypes of sub-micrometer-sized devices, and provides the opportunity to explore the potential performance of 2D materials.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Nanowire Synthesis and Applications · Gas Sensing Nanomaterials and Sensors · Force Microscopy Techniques and Applications
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Affiliations
State Key Laboratory of Robotics Shenyang Institute of Automation Chinese Academy of Science Shenyang 110016 China
University of Chinese Academy of Science Beijing 100049 China
Department of Electrical and Computer Engineering University of Pittsburgh Pittsburgh PA 15213 USA
References
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