Low‐Temperature Vapor‐Phase Growth of 2D Metal Chalcogenides

Abstract 2D metal chalcogenides (MCs) have garnered significant attention from both scientific and industrial communities due to their potential in developing next‐generation functional devices. Vapor‐phase deposition methods have proven highly effective in fabricating high‐quality 2D MCs. Nevertheless, the conventionally high thermal budgets required for synthesizing 2D MCs pose limitations, particularly in the integration of multiple components and in specialized applications (such as flexible electronics). To overcome these challenges, it is desirable to reduce the thermal energy requirements, thus facilitating the growth of various 2D MCs at lower temperatures. Numerous endeavors have been undertaken to develop low‐temperature vapor‐phase growth techniques for 2D MCs, and this review aims to provide an overview of the latest advances in low‐temperature vapor‐phase growth of 2D MCs. Initially, the review highlights the latest progress in achieving high‐quality 2D MCs through various low‐temperature vapor‐phase techniques, including chemical vapor deposition (CVD), metal‐organic CVD, plasma‐enhanced CVD, atomic layer deposition (ALD), etc. The strengths and current limitations of these methods are also evaluated. Subsequently, the review consolidates the diverse applications of 2D MCs grown at low temperatures, covering fields such as electronics, optoelectronics, flexible devices, and catalysis. Finally, current challenges and future research directions are briefly discussed, considering the most recent progress in the field.