journal article·2020-05

Phase‐Controlled Synthesis of Monolayer W1−xRexS2 Alloy with Improved Photoresponse Performance

Zixuan Wang, Xiaoxu Zhao, Yuekun Yang, Lei Qiao, Lu Lv, Zhang Chen, Zengfeng Di, Wei Ren, Stephen J. Pennycook, Jiadong Zhou, Yanfeng Gao

Small· Volume 16· Issue 20
Publisher page

Abstract

Abstract Tuning bandgap and phases in the ternary 2D transition metal dichalcogenides (TMDs) alloys has opened up unexpected opportunities to engineer optoelectronic properties and explore potential applications. In this work, a salt‐assisted chemical deposition vapor (CVD) growth strategy is reported for the creation of high‐quality monolayer W1−xRexS2 alloys to fulfill a readily phase control from 1H to DT by changing the ratio of Re and W precursors. The structures and chemical compositions of doping alloys are confirmed by combining atomic resolution scanning transmission electron microscopy‐annular dark field imaging with energy dispersive X‐ray spectroscopy (EDS) and X‐ray photoelectron spectroscopy, matching well with the calculated results. The field‐effect transistors (FETs) devices fabricated based on 1H‐W0.9Re0.1S2 monolayer exhibit a n‐type semiconducting behavior with the mobility of 0.4 cm2 V−1 s−1. More importantly, the FETs show high‐performance responsivity with a value of 17 µA W−1 in air, which is superior to that of monolayer CVD‐grown WS2. This work paves the way toward synthesizing monolayer ternary alloys with controlled phases for potential optoelectronic applications.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: 2D Materials and Applications · Advanced Photocatalysis Techniques · MXene and MAX Phase Materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

School of Materials Science and Engineering Shanghai University Shanghai 200444 China

Department of Materials Science and Engineering National University of Singapore 9 Engineering Drive 1 Singapore 117575 Singapore

State Key Laboratory of Functional Materials for Informatics Shanghai Institute of Microsystem and Information Technology Chinese Academy of Sciences Shanghai 200050 China

Department of Physics Shanghai Key Laboratory of High Temperature Superconductors MGI and ICQMS Shanghai University Shanghai 200444 China

School of Materials Science and Engineering Nanyang Technological University Singapore 639798 Singapore

Funding

Ministry of Science and Technology of the People's Republic of China

References (41)

Show source-provided references
1. 10.1039/C8NH00150B10.1039/C8NH00150B ↗
2. 10.1038/nphys418810.1038/nphys4188 ↗
3. 10.1038/nnano.2012.19310.1038/nnano.2012.193 ↗
4. 10.1038/s41586-018-0008-310.1038/s41586-018-0008-3 ↗
5. 10.1039/C5NR05712D10.1039/C5NR05712D ↗
6. 10.1103/PhysRevLett.115.12680210.1103/PhysRevLett.115.126802 ↗
7. 10.1021/nl401474810.1021/nl4014748 ↗
8. 10.1002/adma.20170501510.1002/adma.201705015 ↗
9. 10.1021/acs.nanolett.5b0366210.1021/acs.nanolett.5b03662 ↗
10. 10.1021/ja500069b10.1021/ja500069b ↗
11. 10.1021/nn401420h10.1021/nn401420h ↗
12. 10.1038/ncomms1364310.1038/ncomms13643 ↗
13. 10.1002/adma.20180347710.1002/adma.201803477 ↗
14. 10.1002/adma.20170375410.1002/adma.201703754 ↗
15. 10.1103/PhysRevB.88.07542010.1103/PhysRevB.88.075420 ↗
16. 10.1002/adma.20130498510.1002/adma.201304985 ↗
17. 10.1021/acsami.7b0210110.1021/acsami.7b02101 ↗
18. 10.1002/adfm.20170695010.1002/adfm.201706950 ↗
19. 10.1002/adma.20160110410.1002/adma.201601104 ↗
20. 10.1002/adma.20160399110.1002/adma.201603991 ↗
21. 10.1021/acsnano.7b0878210.1021/acsnano.7b08782 ↗
22. 10.1063/1.502825810.1063/1.5028258 ↗
23. 10.1039/C8NR01661E10.1039/C8NR01661E ↗
24. 10.1063/1.497711110.1063/1.4977111 ↗
25. 10.1021/jp207632510.1021/jp2076325 ↗
26. Jiang S. L. · Nano Res. · 2020
27. 10.1021/acsami.8b0588510.1021/acsami.8b05885 ↗
28. 10.1038/ncomms425210.1038/ncomms4252 ↗
29. 10.1002/adma.20150179510.1002/adma.201501795 ↗
30. 10.1002/adma.20160072210.1002/adma.201600722 ↗
31. 10.1039/C6NR07233J10.1039/C6NR07233J ↗
32. 10.1038/nature0887910.1038/nature08879 ↗
33. 10.1002/adma.20180239710.1002/adma.201802397 ↗
34. 10.1021/nn505354a10.1021/nn505354a ↗
35. 10.1021/nn403454e10.1021/nn403454e ↗
36. 10.1039/C4CP02007C10.1039/C4CP02007C ↗
37. 10.1002/adfm.20160348410.1002/adfm.201603484 ↗
38. 10.1002/adfm.20150440810.1002/adfm.201504408 ↗
39. 10.1039/C5NR90175H10.1039/C5NR90175H ↗
40. 10.1002/adfm.20130076010.1002/adfm.201300760 ↗
41. 10.1021/nn202455710.1021/nn2024557 ↗