journal article·2025-10-30

Ferroelectric‐Induced Phase Change Device with Polymorphic Mo 1‐x W x Te 2 for Neuromorphic Computing

Eunji Hwang, Dohyun Kim, Nayeon Kim, Heemyoung Hong, Chang Yun Heo, Woohyun Cho, Ho Yeon Yoo, Kenji Watanabe, Takashi Taniguchi, Heejun Yang

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Abstract

Abstract While phase change devices have emerged as promising candidates for implementing artificial synapses, conventional phase change materials have faced challenges such as high‐power consumption and limited reliability, originating from their Joule heating‐driven phase transition mechanisms. Here, a phase change device based on a 2D material, Mo 0.95 W 0.05 Te 2 is demonstrated, which exhibits a phase transition between semiconducting 2H and semimetallic 1T’ structural phases, facilitated by a ferroelectric substrate. The structural phase transitions are confirmed by Raman spectroscopy under drain or gate voltage bias. These bias conditions allow two types of operation to be realized in a single device structure, resulting in gate voltage modulation and drain voltage modulation with a ferroelectric substrate. The ferroelectric‐induced phase change device exhibits key synaptic functions, including short‐term and long‐term plasticity, along with highly linear and symmetric multilevel conductance states. Furthermore, polymorphic Mo 0.95 W 0.05 Te 2 enables energy consumption as low as 5.3 pJ per switching event at monolayer thickness beyond conventional 3D phase change memory. These features highlight the potential of 2D material‐based phase change devices on ferroelectric substrates as energy‐efficient and high‐performance components for next‐generation neuromorphic computing systems.
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Research context

OpenAlex topics: Advanced Memory and Neural Computing · Ferroelectric and Negative Capacitance Devices · 2D Materials and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Physics Korea Advanced Institute of Science and Technology (KAIST) Daejeon 34141 Republic of Korea

Research Center for Electronic and Optical Materials National Institute for Materials Science 1‐1 Namiki Tsukuba 305‐0044 Japan

Research Center for Materials Nanoarchitectonics National Institute for Materials Science 1‐1 Namiki Tsukuba 305‐0044 Japan

Graduate School of Semiconductor Technology School of Electrical Engineering Korea Advanced Institute of Science and Technology (KAIST) Daejeon 34141 Republic of Korea

Funding

National Research Foundation of Korea · Samsung Science and Technology Foundation

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