journal article·2024-08Open access

The Nanoscale Structure and Stability of Organic Photovoltaic Blends Processed with Solvent Additives

Rachel C. Kilbride, Emma L. K. Spooner, Stephanie L. Burg, Bárbara L. Oliveira, Ana Charas, Gabriel Bernardo, Robert Dalgliesh, Stephen King, David G. Lidzey, Richard A. L. Jones, Andrew J. Parnell

Small· Volume 20· Issue 33

Abstract

Abstract Controlling the nanomorphology in bulk heterojunction photoactive blends is crucial for optimizing the performance and stability of organic photovoltaic (OPV) technologies. A promising approach is to alter the drying dynamics and consequently, the nanostructure of the blend film using solvent additives such as 1,8‐diiodooctane (DIO). Although this approach is demonstrated extensively for OPV systems incorporating fullerene‐based acceptors, it is unclear how solvent additive processing influences the morphology and stability of nonfullerene acceptor (NFA) systems. Here, small angle neutron scattering (SANS) is used to probe the nanomorphology of two model OPV systems processed with DIO: a fullerene‐based system (PBDB‐T:PC71BM) and an NFA‐based system (PBDB‐T:ITIC). To overcome the low intrinsic neutron scattering length density contrast in polymer:NFA blend films, the synthesis of a deuterated NFA analog (ITIC‐d52) is reported. Using SANS, new insights into the nanoscale evolution of fullerene and NFA‐based systems are provided by characterizing films immediately after fabrication, after thermal annealing, and after aging for 1 year. It is found that DIO processing influences fullerene and NFA‐based systems differently with NFA‐based systems characterized by more phase‐separated domains. After long‐term aging, SANS reveals both systems demonstrate some level of thermodynamic induced domain coarsening.
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Research context

OpenAlex topics: Organic Electronics and Photovoltaics · Thin-Film Transistor Technologies · Thermal properties of materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Chemistry The University of Sheffield Dainton Building, Brook Hill Sheffield S3 7HF United Kingdom

Department of Physics and Astronomy The University of Sheffield Hicks Building, Hounsfield Road Sheffield S3 7RH United Kingdom

The Photon Science Institute The University of Manchester Oxford Road Manchester M13 9PY United Kingdom

Instituto de Telecomunicações Instituto Superior Técnico Av. Rovisco Pais Lisboa P‐1049‐001 Portugal

LEPABE – Laboratory for Process Engineering Environment Biotechnology and Energy Faculty of Engineering University of Porto Porto 4200–465 Portugal

ALiCE – Associate Laboratory in Chemical Engineering Faculty of Engineering University of Porto Porto 4200–465 Portugal

ISIS Neutron and Muon Spallation Source Rutherford Appleton Laboratories Oxfordshire OX11 0QX United Kingdom

Department of Materials The University of Manchester Sackville Street Building Manchester M1 3BB United Kingdom

Funding

Engineering and Physical Sciences Research Council · National Science Foundation

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