journal article·2014-08-26Open access

Electrical Transport Properties of Single-Layer WS2

Dmitry Ovchinnikov, Adrien Allain, Ying-Sheng Huang, Dumitru Dumcenco, Andras Kis

ACS Nano· Volume 8· Issue 8

Abstract

We report on the fabrication of field-effect transistors based on single layers and bilayers of the semiconductor WS2 and the investigation of their electronic transport properties. We find that the doping level strongly depends on the device environment and that long in situ annealing drastically improves the contact transparency, allowing four-terminal measurements to be performed and the pristine properties of the material to be recovered. Our devices show n-type behavior with a high room-temperature on/off current ratio of ∼10(6). They show clear metallic behavior at high charge carrier densities and mobilities as high as ∼140 cm(2)/(V s) at low temperatures (above 300 cm(2)/(V s) in the case of bilayers). In the insulating regime, the devices exhibit variable-range hopping, with a localization length of about 2 nm that starts to increase as the Fermi level enters the conduction band. The promising electronic properties of WS2, comparable to those of single-layer MoS2 and WSe2, together with its strong spin-orbit coupling, make it interesting for future applications in electronic, optical, and valleytronic devices.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: 2D Materials and Applications · MXene and MAX Phase Materials · Graphene research and applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Electrical Engineering Institute, Ecole Polytechnique Federale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland

Department of Electronic Engineering, National Taiwan University of Science and Technology, Taipei 106, Taiwan

Funding

European Commission · Swiss National Science Foundation

References (47)

Show source-provided references
1. Novoselov K. S. · Science · 2004 · 306 · 66610.1126/science.1102896 ↗
2. Bolotin K. I. · Solid State Commun. · 2008 · 146 · 35110.1016/j.ssc.2008.02.024 ↗
3. Wang Q. H. · Nat. Nanotechnol. · 2012 · 7 · 69910.1038/nnano.2012.193 ↗
4. Radisavljevic B. · ACS Nano · 2011 · 5 · 993410.1021/nn203715c ↗
5. Wang H. · Nano Lett. · 2012 · 12 · 467410.1021/nl302015v ↗
6. Radisavljevic B. · Appl. Phys. Lett. · 2012 · 101 · 04310310.1063/1.4738986 ↗
7. Bertolazzi S. · ACS Nano · 2013 · 7 · 324610.1021/nn3059136 ↗
8. Pu J. · Nano Lett. · 2012 · 12 · 401310.1021/nl301335q ↗
9. Lebegue S. · Phys. Rev. B · 2009 · 79 · 11540910.1103/PhysRevB.79.115409 ↗
10. Splendiani A. · Nano Lett. · 2010 · 10 · 127110.1021/nl903868w ↗
11. Mak K. F. · Phys. Rev. Lett. · 2010 · 105 · 13680510.1103/PhysRevLett.105.136805 ↗
12. Kuc A. · Phys. Rev. B · 2011 · 83 · 24521310.1103/PhysRevB.83.245213 ↗
13. Lopez-Sanchez O. · Nat. Nanotechnol. · 2013 · 8 · 49710.1038/nnano.2013.100 ↗
14. Yin Z. · ACS Nano · 2012 · 6 · 7410.1021/nn2024557 ↗
15. Radisavljevic B. · Nat. Mater. · 2013 · 12 · 81510.1038/nmat3687 ↗
16. Baugher B. W. H. · Nano Lett. · 2013 · 13 · 421210.1021/nl401916s ↗
17. Jariwala D. · Appl. Phys. Lett. · 2013 · 102 · 17310710.1063/1.4803920 ↗
18. Elías A. L. · ACS Nano · 2013 · 7 · 523510.1021/nn400971k ↗
19. Liu L. · IEEE Trans. Electron Devices · 2011 · 58 · 304210.1109/TED.2011.2159221 ↗
20. Zhu Z. Y. · Phys. Rev. B · 2011 · 84 · 15340210.1103/PhysRevB.84.153402 ↗
21. Xiao D. · Phys. Rev. Lett. · 2012 · 108 · 19680210.1103/PhysRevLett.108.196802 ↗
22. Mak K. F. · Science · 2014 · 344 · 148910.1126/science.1250140 ↗
23. Gutiérrez H. R. · Nano Lett. · 2012 · 13 · 344710.1021/nl3026357 ↗
24. Elías A. L. · ACS Nano · 2013 · 7 · 523510.1021/nn400971k ↗
25. Lee Y.-H. · Nano Lett. · 2013 · 13 · 185210.1021/nl400687n ↗
26. Hwang W. S. · Appl. Phys. Lett. · 2012 · 101 · 01310710.1063/1.4732522 ↗
27. Georgiou T. · Nat. Nanotechnol. · 2012 · 8 · 10010.1038/nnano.2012.224 ↗
28. Braga D. · Nano Lett. · 2012 · 12 · 521810.1021/nl302389d ↗
29. Jo S. · Nano Lett. · 2014 · 14 · 201910.1021/nl500171v ↗
30. Withers F. · Sci. Rep. · 2014 · 4 · 496710.1038/srep04967 ↗
31. Qiu H. · Appl. Phys. Lett. · 2012 · 100 · 12310410.1063/1.3696045 ↗
32. Yue Q. · Nanoscale Res. Lett. · 2013 · 8 · 42510.1186/1556-276X-8-425 ↗
33. El-Mahalawy S. H. · Phys. Status Solidi B · 1977 · 79 · 71310.1002/pssb.2220790238 ↗
34. Fivaz R. · Phys. Rev. · 1967 · 163 · 74310.1103/PhysRev.163.743 ↗
35. Schmidt H. · Nano Lett. · 2014 · 14 · 190910.1021/nl4046922 ↗
36. Kaasbjerg K. · Phys. Rev. B · 2012 · 85 · 11531710.1103/PhysRevB.85.115317 ↗
37. Kaasbjerg K. · Phys. Rev. B · 2013 · 87 · 23531210.1103/PhysRevB.87.235312 ↗
38. Ma N. · Phys. Rev. X · 2014 · 4 · 011043
39. Ong Z.-Y. · Phys. Rev. B · 2013 · 88 · 16531610.1103/PhysRevB.88.165316 ↗
40. Kim S. · Nat. Commun. · 2012 · 3 · 101110.1038/ncomms2018 ↗
41. Zhu W. · Nat. Commun. · 2014 · 5
42. Lösche A. · Kristall Technik · 1972 · 7 · K5510.1002/crat.19720070420 ↗
43. Van Keuls F. W. · Phys. Rev. B · 1997 · 56 · 116110.1103/PhysRevB.56.1161 ↗
44. Ghatak S. · ACS Nano · 2011 · 5 · 770710.1021/nn202852j ↗
45. Fang H. · Nano Lett. · 2012 · 12 · 378810.1021/nl301702r ↗
46. Liu W. · Nano Lett. · 2013 · 13 · 198310.1021/nl304777e ↗
47. Agarwal M. K. · J. Cryst. Growth · 1979 · 46 · 13910.1016/0022-0248(79)90122-2 ↗