Large-Area Synthesis of Highly Crystalline WSe2 Monolayers and Device Applications
Source abstract
Abstract
The monolayer transition metal dichalcogenides have recently attracted much attention owing to their potential in valleytronics, flexible and low-power electronics, and optoelectronic devices. Recent reports have demonstrated the growth of large-size two-dimensional MoS2 layers by the sulfurization of molybdenum oxides. However, the growth of a transition metal selenide monolayer has still been a challenge. Here we report that the introduction of hydrogen in the reaction chamber helps to activate the selenization of WO3, where large-size WSe2 monolayer flakes or thin films can be successfully grown. The top-gated field-effect transistors based on WSe2 monolayers using ionic gels as the dielectrics exhibit ambipolar characteristics, where the hole and electron mobility values are up to 90 and 7 cm(2)/Vs, respectively. These films can be transferred onto arbitrary substrates, which may inspire research efforts to explore their properties and applications. The resistor-loaded inverter based on a WSe2 film, with a gain of ∼13, further demonstrates its applicability for logic-circuit integrations.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: 2D Materials and Applications · MXene and MAX Phase Materials · Advanced Photocatalysis Techniques
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 106, Taiwan
Department of Applied Physics, Waseda University, Tokyo 169-8555, Japan
Department of Electrophysics, National Chiao Tung University, Hsinchu 300, Taiwan
Quantum-Phase Electronics Center and Department of Applied Physics, School of Engineering, The University of Tokyo, Hongo, Bunkyo, Tokyo 113-8654, Japan
Department of Medical Research, China Medical University Hospital, Taichung, Taiwan
References (54)
Show source-provided references
1. Chhowalla M. · Nat. Chem. · 2013 · 5 · 26310.1038/nchem.1589 ↗
2. Ataca C. · J. Phys. Chem. C · 2012 · 116 · 898310.1021/jp212558p ↗
3. Huang X. · Chem. Soc. Rev. · 2013 · 42 · 193410.1039/c2cs35387c ↗
4. Kashid R. V. · Small · 2013 · 9 · 273010.1002/smll.201300002 ↗
5. Splendiani A. · Nano Lett. · 2010 · 10 · 127110.1021/nl903868w ↗
6. Aharon E. · Adv. Funct. Mater. · 2006 · 16 · 98010.1002/adfm.200500458 ↗
7. Mak K. F. · Phys. Rev. Lett. · 2010 · 105 · 136805-1-4
8. Lee C. · ACS Nano · 2010 · 4 · 269510.1021/nn1003937 ↗
9. Molina-Sánchez A. · Phys. Rev. B · 2011 · 84 · 155413-1-810.1103/PhysRevB.84.155413 ↗
10. Korn T. · Appl. Phys. Lett. · 2011 · 99 · 102109-1-310.1063/1.3636402 ↗
11. Ghatak S. · ACS Nano · 2011 · 5 · 770710.1021/nn202852j ↗
12. Eda G. · Nano Lett. · 2011 · 11 · 511110.1021/nl201874w ↗
13. Zeng H. · Nat. Nanotechnol. · 2012 · 7 · 49010.1038/nnano.2012.95 ↗
14. Pu J. · Nano Lett. · 2012 · 12 · 401310.1021/nl301335q ↗
15. Mak K. F. · Nat. Mater. · 2013 · 12 · 20710.1038/nmat3505 ↗
16. Zhang W. · arXiv:1302.1230 · 2013
17. Radisavljevic B. · Nat. Nanotechnol. · 2011 · 6 · 14710.1038/nnano.2010.279 ↗
18. Liu H. · ACS Nano · 2012 · 6 · 856310.1021/nn303513c ↗
19. Zhang Y. J. · Nano Lett. · 2013 · 13 · 302310.1021/nl400902v ↗
20. Zhang Y. J. · Nano Lett. · 2012 · 12 · 113610.1021/nl2021575 ↗
21. Nam H. · ACS Nano · 2013 · 7 · 587010.1021/nn401093u ↗
22. Chen M. · Appl. Phys. Lett. · 2013 · 103 · 142110-1-3
23. Fang H. · Nano Lett. · 2012 · 12 · 378810.1021/nl301702r ↗
24. Podzorov V. · Appl. Phys. Lett. · 2004 · 84 · 330110.1063/1.1723695 ↗
25. Liu W. · Nano Lett. · 2013 · 13 · 198310.1021/nl304777e ↗
26. Glemser O. · Z. Anorg. Chem. · 1948 · 257 · 24110.1002/zaac.19482570503 ↗
27. Schäfer H. · J. Less-Common Met. · 1968 · 16 · 29010.1016/0022-5088(68)90027-1 ↗
28. Al-Hilli A. A. · J. Cryst. Growth · 1972 · 15 · 9310.1016/0022-0248(72)90129-7 ↗
29. Brixner L. H. · J. Inorg. Nucl. Chem. · 1962 · 24 · 25710.1016/0022-1902(62)80178-X ↗
30. Brixner L. H. · J. Electrochem. Soc. · 1963 · 110 · 28910.1149/1.2425734 ↗
31. Hicks W. T. · J. Electrochem. Soc. · 1964 · 111 · 105810.1149/1.2426317 ↗
32. Merzhanov A. G. · Izv. Akad. Nauk SSSR, Neorg. Mater. · 1977 · 13 · 811
33. Obolonchik V. A. · Zh. Prikl. Khim. Leningrad · 1971 · 44 · 2160
34. Tsirlina T. · Fullerene Sci. Technol. · 1998 · 6 · 15710.1080/10641229809350191 ↗
35. Lee Y. H. · Adv. Mater. · 2012 · 24 · 232010.1002/adma.201104798 ↗
36. Lee Y.-H. · Nano Lett. · 2013 · 13 · 185210.1021/nl400687n ↗
37. Lin Y.-C. · Nanoscale · 2012 · 4 · 663710.1039/c2nr31833d ↗
38. Seo J. · Angew. Chem., Int. Ed. · 2007 · 46 · 882810.1002/anie.200703175 ↗
39. Li H. · Small · 2013 · 9 · 197410.1002/smll.201202919 ↗
40. Mead D. G. · Can. J. Phys. · 1977 · 55 · 37910.1139/p77-052 ↗
41. Sourisseau C. · Chem. Phys. · 1991 · 150 · 28110.1016/0301-0104(91)80136-6 ↗
42. Frey G. L. · Phys. Rev. B · 1999 · 60 · 288310.1103/PhysRevB.60.2883 ↗
43. Sekine T. · J. Phys. Soc. Jpn. · 1980 · 49 · 106910.1143/JPSJ.49.1069 ↗
44. Lee C. · ACS Nano · 2010 · 4 · 269510.1021/nn1003937 ↗
45. Zhao W. · ACS Nano · 2013 · 7 · 79110.1021/nn305275h ↗
46. Beal A. R. · J. Phys. C: Solid State Phys. · 1972 · 5 · 354010.1088/0022-3719/5/24/016 ↗
47. Bromley R. A. · J. Phys. C: Solid State Phys. · 1972 · 5 · 75910.1088/0022-3719/5/7/007 ↗
48. Kuc A. · Phys. Rev. B · 2011 · 83 · 245213-1-4
49. Jiang H. · J. Phys. Chem. C · 2012 · 116 · 766410.1021/jp300079d ↗
50. Zeng H. · Sci. Rep. · 2013 · 3 · 1608-1-5
51. Salitra G. · Thin Solid Films · 1994 · 245 · 18010.1016/0040-6090(94)90896-6 ↗
52. Schellenberger A. · Surf. Sci. · 1991 · 241 · L2510.1016/0039-6028(91)90083-5 ↗
53. Hulliger F. · 197610.1007/978-94-010-1146-4 ↗
54. Xia J. · Nat. Nanotechnol. · 2009 · 4 · 50510.1038/nnano.2009.177 ↗