journal article·2014-01-28Open access

Large-Area Synthesis of Highly Crystalline WSe2 Monolayers and Device Applications

Jing-Kai Huang, Jiang Pu, Chang-Lung Hsu, Ming-Hui Chiu, Zhen-Yu Juang, Yung-Huang Chang, Wen-Hao Chang, Yoshihiro Iwasa, Taishi Takenobu, Lain-Jong Li

ACS Nano· Volume 8· Issue 1

Abstract

The monolayer transition metal dichalcogenides have recently attracted much attention owing to their potential in valleytronics, flexible and low-power electronics, and optoelectronic devices. Recent reports have demonstrated the growth of large-size two-dimensional MoS2 layers by the sulfurization of molybdenum oxides. However, the growth of a transition metal selenide monolayer has still been a challenge. Here we report that the introduction of hydrogen in the reaction chamber helps to activate the selenization of WO3, where large-size WSe2 monolayer flakes or thin films can be successfully grown. The top-gated field-effect transistors based on WSe2 monolayers using ionic gels as the dielectrics exhibit ambipolar characteristics, where the hole and electron mobility values are up to 90 and 7 cm(2)/Vs, respectively. These films can be transferred onto arbitrary substrates, which may inspire research efforts to explore their properties and applications. The resistor-loaded inverter based on a WSe2 film, with a gain of ∼13, further demonstrates its applicability for logic-circuit integrations.
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Research context

OpenAlex topics: 2D Materials and Applications · MXene and MAX Phase Materials · Advanced Photocatalysis Techniques

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 106, Taiwan

Department of Applied Physics, Waseda University, Tokyo 169-8555, Japan

Department of Electrophysics, National Chiao Tung University, Hsinchu 300, Taiwan

Quantum-Phase Electronics Center and Department of Applied Physics, School of Engineering, The University of Tokyo, Hongo, Bunkyo, Tokyo 113-8654, Japan

Department of Medical Research, China Medical University Hospital, Taichung, Taiwan

References (54)

Show source-provided references
1. Chhowalla M. · Nat. Chem. · 2013 · 5 · 26310.1038/nchem.1589 ↗
2. Ataca C. · J. Phys. Chem. C · 2012 · 116 · 898310.1021/jp212558p ↗
3. Huang X. · Chem. Soc. Rev. · 2013 · 42 · 193410.1039/c2cs35387c ↗
4. Kashid R. V. · Small · 2013 · 9 · 273010.1002/smll.201300002 ↗
5. Splendiani A. · Nano Lett. · 2010 · 10 · 127110.1021/nl903868w ↗
6. Aharon E. · Adv. Funct. Mater. · 2006 · 16 · 98010.1002/adfm.200500458 ↗
7. Mak K. F. · Phys. Rev. Lett. · 2010 · 105 · 136805-1-4
8. Lee C. · ACS Nano · 2010 · 4 · 269510.1021/nn1003937 ↗
9. Molina-Sánchez A. · Phys. Rev. B · 2011 · 84 · 155413-1-810.1103/PhysRevB.84.155413 ↗
10. Korn T. · Appl. Phys. Lett. · 2011 · 99 · 102109-1-310.1063/1.3636402 ↗
11. Ghatak S. · ACS Nano · 2011 · 5 · 770710.1021/nn202852j ↗
12. Eda G. · Nano Lett. · 2011 · 11 · 511110.1021/nl201874w ↗
13. Zeng H. · Nat. Nanotechnol. · 2012 · 7 · 49010.1038/nnano.2012.95 ↗
14. Pu J. · Nano Lett. · 2012 · 12 · 401310.1021/nl301335q ↗
15. Mak K. F. · Nat. Mater. · 2013 · 12 · 20710.1038/nmat3505 ↗
16. Zhang W. · arXiv:1302.1230 · 2013
17. Radisavljevic B. · Nat. Nanotechnol. · 2011 · 6 · 14710.1038/nnano.2010.279 ↗
18. Liu H. · ACS Nano · 2012 · 6 · 856310.1021/nn303513c ↗
19. Zhang Y. J. · Nano Lett. · 2013 · 13 · 302310.1021/nl400902v ↗
20. Zhang Y. J. · Nano Lett. · 2012 · 12 · 113610.1021/nl2021575 ↗
21. Nam H. · ACS Nano · 2013 · 7 · 587010.1021/nn401093u ↗
22. Chen M. · Appl. Phys. Lett. · 2013 · 103 · 142110-1-3
23. Fang H. · Nano Lett. · 2012 · 12 · 378810.1021/nl301702r ↗
24. Podzorov V. · Appl. Phys. Lett. · 2004 · 84 · 330110.1063/1.1723695 ↗
25. Liu W. · Nano Lett. · 2013 · 13 · 198310.1021/nl304777e ↗
26. Glemser O. · Z. Anorg. Chem. · 1948 · 257 · 24110.1002/zaac.19482570503 ↗
27. Schäfer H. · J. Less-Common Met. · 1968 · 16 · 29010.1016/0022-5088(68)90027-1 ↗
28. Al-Hilli A. A. · J. Cryst. Growth · 1972 · 15 · 9310.1016/0022-0248(72)90129-7 ↗
29. Brixner L. H. · J. Inorg. Nucl. Chem. · 1962 · 24 · 25710.1016/0022-1902(62)80178-X ↗
30. Brixner L. H. · J. Electrochem. Soc. · 1963 · 110 · 28910.1149/1.2425734 ↗
31. Hicks W. T. · J. Electrochem. Soc. · 1964 · 111 · 105810.1149/1.2426317 ↗
32. Merzhanov A. G. · Izv. Akad. Nauk SSSR, Neorg. Mater. · 1977 · 13 · 811
33. Obolonchik V. A. · Zh. Prikl. Khim. Leningrad · 1971 · 44 · 2160
34. Tsirlina T. · Fullerene Sci. Technol. · 1998 · 6 · 15710.1080/10641229809350191 ↗
35. Lee Y. H. · Adv. Mater. · 2012 · 24 · 232010.1002/adma.201104798 ↗
36. Lee Y.-H. · Nano Lett. · 2013 · 13 · 185210.1021/nl400687n ↗
37. Lin Y.-C. · Nanoscale · 2012 · 4 · 663710.1039/c2nr31833d ↗
38. Seo J. · Angew. Chem., Int. Ed. · 2007 · 46 · 882810.1002/anie.200703175 ↗
39. Li H. · Small · 2013 · 9 · 197410.1002/smll.201202919 ↗
40. Mead D. G. · Can. J. Phys. · 1977 · 55 · 37910.1139/p77-052 ↗
41. Sourisseau C. · Chem. Phys. · 1991 · 150 · 28110.1016/0301-0104(91)80136-6 ↗
42. Frey G. L. · Phys. Rev. B · 1999 · 60 · 288310.1103/PhysRevB.60.2883 ↗
43. Sekine T. · J. Phys. Soc. Jpn. · 1980 · 49 · 106910.1143/JPSJ.49.1069 ↗
44. Lee C. · ACS Nano · 2010 · 4 · 269510.1021/nn1003937 ↗
45. Zhao W. · ACS Nano · 2013 · 7 · 79110.1021/nn305275h ↗
46. Beal A. R. · J. Phys. C: Solid State Phys. · 1972 · 5 · 354010.1088/0022-3719/5/24/016 ↗
47. Bromley R. A. · J. Phys. C: Solid State Phys. · 1972 · 5 · 75910.1088/0022-3719/5/7/007 ↗
48. Kuc A. · Phys. Rev. B · 2011 · 83 · 245213-1-4
49. Jiang H. · J. Phys. Chem. C · 2012 · 116 · 766410.1021/jp300079d ↗
50. Zeng H. · Sci. Rep. · 2013 · 3 · 1608-1-5
51. Salitra G. · Thin Solid Films · 1994 · 245 · 18010.1016/0040-6090(94)90896-6 ↗
52. Schellenberger A. · Surf. Sci. · 1991 · 241 · L2510.1016/0039-6028(91)90083-5 ↗
53. Hulliger F. · 197610.1007/978-94-010-1146-4 ↗
54. Xia J. · Nat. Nanotechnol. · 2009 · 4 · 50510.1038/nnano.2009.177 ↗