Plasma Sputtering Halide Perovskite for Photovoltaic Applications

Halide perovskite solar cells (PSCs) have reached a certified efficiency of 26.1% due to the excellent photoelectric properties of perovskite thin films, showing significant commercialization prospects. Preparing high-performance PSCs with uniform, large-area perovskite thin films remains challenging. Magnetron sputtering is a common method of film preparation in industry, which has the advantage of easy control over film crystallization, high repeatability, and low cost. And recently, it also exhibits promise in perovskite thin film preparation. This review first introduces the principle and the advantages of magnetron sputtering of perovskite thin films, where the role of plasma is highlighted. Then, the effects of plasma on perovskite film quality are systematically discussed, including the elemental ratio, crystallinity, and defect density. Subsequently, we review the recent advances in magnetron sputtering of perovskite thin films for photovoltaic applications. Finally, possible directions for fabricating high-quality perovskite thin films and high-performance PSCs via magnetron sputtering are discussed, including sputtering process optimization, target composition adjustment, and post-treatment processes. With these strategies, the development of magnetron sputtered PSCs toward commercialization may be achieved soon.