journal article·2024-04-12Open access

Reversible Oxidative p-Doping in 2D Tin Halide Perovskite Field-Effect Transistors

Yeeun Kim, Jaeyong Woo, Young-Kwang Jung, Heebeom Ahn, Inha Kim, Youjin Reo, Hyungbin Lim, Changjun Lee, Jonghoon Lee, Yongjin Kim, Hyeonmin Choi, Min-Hyun Lee, Jeongjae Lee, Samuel D. Stranks, Henning Sirringhaus, Yong-Young Noh, Keehoon Kang, Takhee Lee

ACS Energy Letters· Volume 9· Issue 4

Abstract

Tin (Sn) halide perovskites are promising materials for various electronic applications due to their favorable properties. However, facile interaction with atmospheric oxygen (O 2 ) often hinders the practical use of Sn-based perovskites, which is regarded as a major cause of undesired variations in their electrical and structural properties. Herein, we report the reversible p-doping in phenethylammonium tin iodide ((PEA) 2 SnI 4 ) transistors when they are exposed sequentially to ambient and vacuum conditions. Exposure to ambient conditions induces p-doping effects that lead to a significant shift in the threshold voltage. Interestingly, we have found that the unintentionally p-doped (PEA) 2 SnI 4 transistors can be fully restored by simply exposing them to vacuum, indicating a complete dedoping without any structural or operational degradation. Our first-principles calculations further support the observations by revealing that the doping by O 2 molecules occurs via occupying the interstitial sites that form acceptor levels close to the valence band maximum of (PEA) 2 SnI 4 .
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Research context

OpenAlex topics: Perovskite Materials and Applications · Conducting polymers and applications · Gas Sensing Nanomaterials and Sensors

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Physics and Astronomy and Institute of Applied Physics, Seoul National University, Seoul 08826, Korea

Department of Chemical Engineering and Biotechnology, University of Cambridge, Philippa Fawcett Drive, Cambridge CB3 0AS, United Kingdom

Department of Physics and Astronomy, Institute of Applied Physics, Department of Materials Science and Engineering, and Research Institute of Advanced Materials, Seoul National University, Seoul 08826, Korea

Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Gyeongbuk, Korea

Department of Materials Science and Engineering, and Research Institute of Advanced Materials, Seoul National University, Seoul 08826, Korea

Samsung Advanced Institute of Technology (SAIT), Samsung Electronics Co. Ltd., Suwon 16678, Gyeonggi-do, Korea

School of Earth and Environmental Sciences, Seoul National University, Seoul 08826, Korea

Cavendish Laboratory, University of Cambridge, JJ Thomson Avenue, Cambridge CB3 0HE, United Kingdom

Department of Materials Science and Engineering, Research Institute of Advanced Materials, and Institute of Applied Physics, Seoul National University, Seoul 08826, Korea

Funding

Samsung · Engineering and Physical Sciences Research Council · Royal Society · UK Research and Innovation · National Research Foundation of Korea · Tata Sons · Seoul National University

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