journal article·2023-10-13

Direct Optical Lithography of Colloidal InP-Based Quantum Dots with Ligand Pair Treatment

Jaehwan Lee, Jaeyeong Ha, Hyungdoh Lee, Hyunjin Cho, Doh C. Lee, Dmitri V. Talapin, Himchan Cho

ACS Energy Letters· Volume 8· Issue 10
Publisher page

Abstract

Direct optical lithography presents a promising patterning method for colloidal quantum dots (QDs). However, additional care needs to be taken to prevent deterioration of the optical properties of QDs upon patterning, especially for InP-based QDs. This study proposes an efficient method for high-resolution patterning of InP-based QDs using a photoacid generator while preserving their optical properties. Specifically, our solid-state ligand exchange strategy, replacing chloride ligands with long-chain amine/carboxylate pair ligands, successfully recovered the photoluminescence quantum yield (PLQY) of the patterned InP-based QD films to ∼67% of the original PLQY. Upon examination of the origins of the PLQY reduction during patterning, we concluded that the formation of deep traps caused by the exchanged chloride ligands was the primary cause. Finally, we fabricated high-resolution (feature size: 1 μm), multicolored patterns of InP-based QDs, thereby demonstrating the potential of the proposed patterning method for next-generation high-resolution displays and optoelectronic devices.
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Research context

OpenAlex topics: Quantum Dots Synthesis And Properties · Nanofabrication and Lithography Techniques · Near-Field Optical Microscopy

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea

Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology, 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea

Department of Chemistry, James Franck Institute, and Pritzker School of Molecular Engineering, University of Chicago, Chicago, Illinois 60637, United States

Center for Nanoscale Materials, Argonne National Laboratory, Argonne, Illinois 60439, United States

Department of Materials Science and Engineering, Graduate School of Semiconductor Technology, Korea Advanced Institute of Science and Technology, 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea

Funding

Division of Chemistry · Samsung · Samsung Advanced Institute of Technology · National Institute of Standards and Technology · National Research Foundation of Korea · Ministry of SMEs and Startups · Korea Advanced Institute of Science and Technology

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