The Origin of Lower Hole Carrier Concentration in Methylammonium Tin Halide Films Grown by a Vapor-Assisted Solution Process
Source abstract
Abstract
A low hole carrier concentration in methylammonium tin halide (MASnX 3 ) perovskite semiconductors is a prerequisite for a nonshorting solar cell device. In-depth film characterizations were performed on MASnI 3– x Br x films, fabricated by both a low-temperature vapor-assisted solution process (LT-VASP) and conventional one-step methods, to reveal the origin of the lower hole carrier concentration from films of the former approach. We found that the vaporization of CH 3 NH 3 I solid at 150 °C, the temperature at which the LT-VASP occurs, does not supply iodine to the SnX 2 (X = Br, I) films. As a result, secondary phases form aside from the desired MASnX 3 perovskite; the secondary phases are suggested to be SnO and Sn(OH) 2 via a proposed reaction pathway and are further supported by X-ray photoemission spectroscopy (XPS). These nonperovskite Sn 2+ phases are beneficial because they assist in achieving the lower hole-doping levels in LT-VASP films. Remarkably, LT-VASP devices demonstrate improved air stability. Overall, our findings suggest that not only the commonly used SnF 2 but also other divalent Sn compounds could serve as Sn vacancy suppressors. Further work on modulating the perovskite film compositions could realize more efficient and stable tin-based perovskite solar cells.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Perovskite Materials and Applications · Chalcogenide Semiconductor Thin Films · Organic and Molecular Conductors Research
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Chemistry, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States
Mitsubishi Chemical Group Science & Technology Research Center, Inc., 1000 Kamoshida-cho, Aoba-ku, Yokohama 227-8502, Japan
Funding
Link Foundation · Basic Energy Sciences · Mitsubishi International Corporation
References (37)
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