journal article·2012-08

Influence of different percentages of N‐phenylaminopropyl—poss on the degradation kinetic of epoxy resin

Vinícius Pistor, Bluma Guenther Soares, Raquel Santos Mauler

Polymer Composites· Volume 33· Issue 8
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Abstract

Abstract In the present study, nanocomposites were prepared with different contents (1, 2, 5, 10% by weight) of polyhedral oligomeric silsesquioxane—POSS n‐phenylaminopropyl in an epoxy matrix. The samples were characterized by thermogravimetric analysis (TGA), transmission electron microscopy (TEM), and X‐ray diffraction (XRD). TGA analyses were performed at different heating rates to allow for the prediction of the kinetic parameters of degradation. XRD analyses were used to calculate the average molecular interchain spacing. TGA analysis showed that the presence of POSS increased the thermal stability of the nanocomposites. An increase in the activation energy on degradation was evidenced through the kinetic parameters, especially for the 10% POSS. Moreover, the addition of POSS changed the kinetic mechanism of the deceleratory mode (Fn) in favor of the diffusion (Dn) process. The diffusion mechanism is corroborated by the XRD analyses that showed the increase of distance between chains when was added POSS. POLYM. COMPOS., 2012. © 2012 Society of Plastics Engineers
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Research context

OpenAlex topics: Silicone and Siloxane Chemistry · Thermal and Kinetic Analysis · Polymer Nanocomposites and Properties

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (39)

Show source-provided references
1. 10.1002/(SICI)1099-0739(199810/11)12:10/11<707::AID-AOC776>3.0.CO;2-110.1002/(SICI)1099-0739(199810/11)12:10/11<707::AID-AOC776>3.0.CO;2-1 ↗
2. 10.1016/j.polymer.2007.03.05210.1016/j.polymer.2007.03.052 ↗
3. G.J.S.Goulart BR. Patent 8802 734‐1 (2009).
4. D.Guery M.Martin P.Dubois M.Alexandre F.Dubouloz L.Bonnaud andG.Guerlement BR. Patent 0700 216‐5 (2007).
5. A.BurnandD.A.Ballard BR. Patent 0705 935‐3 (2009).
6. G.Marinucci G.W.Lebrão andJ.Rosse BR. Patent 0800 975‐9 (2009).
7. 10.1016/j.polymer.2007.03.06710.1016/j.polymer.2007.03.067 ↗
8. 10.1016/j.polymer.2006.09.04010.1016/j.polymer.2006.09.040 ↗
9. 10.1016/j.polymer.2005.09.05610.1016/j.polymer.2005.09.056 ↗
10. 10.1002/pc.2218110.1002/pc.22181 ↗
11. 10.1016/j.polymer.2004.06.00810.1016/j.polymer.2004.06.008 ↗
12. 10.1021/ma050431810.1021/ma0504318 ↗
13. 10.1007/s10973-008-9213-x10.1007/s10973-008-9213-x ↗
14. Zhang Z. · Polym. Comp. · 2007 · 28 · 754
15. 10.1016/j.eurpolymj.2005.01.02110.1016/j.eurpolymj.2005.01.021 ↗
16. 10.1002/pi.269810.1002/pi.2698 ↗
17. 10.1246/bcsj.38.188110.1246/bcsj.38.1881 ↗
18. 10.1246/bcsj.39.207110.1246/bcsj.39.2071 ↗
19. 10.6028/jres.070A.04310.6028/jres.070A.043 ↗
20. 10.1016/j.tca.2010.06.02810.1016/j.tca.2010.06.028 ↗
21. 10.1016/j.polymdegradstab.2010.12.00710.1016/j.polymdegradstab.2010.12.007 ↗
22. 10.1016/0040-6031(89)85192-510.1016/0040-6031(89)85192-5 ↗
23. 10.1016/S0032-3861(99)00687-410.1016/S0032-3861(99)00687-4 ↗
24. 10.1002/app.2012310.1002/app.20123 ↗
25. 10.1023/A:101011592634010.1023/A:1010115926340 ↗
26. 10.1002/app.1991.07043011510.1002/app.1991.070430115 ↗
27. 10.1590/S0104-1428200800010001510.1590/S0104-14282008000100015 ↗
28. 10.1002/pi.147310.1002/pi.1473 ↗
29. 10.1002/pat.1995.22006020110.1002/pat.1995.220060201 ↗
30. 10.1016/0141-3910(95)00084-Y10.1016/0141-3910(95)00084-Y ↗
31. 10.1016/j.polymdegradstab.2007.08.00410.1016/j.polymdegradstab.2007.08.004 ↗
32. 10.1016/j.polymdegradstab.2009.05.02010.1016/j.polymdegradstab.2009.05.020 ↗
33. 10.1002/polb.2193910.1002/polb.21939 ↗
34. 10.1002/polb.2178810.1002/polb.21788 ↗
35. 10.1021/cm034308b10.1021/cm034308b ↗
36. 10.1021/jp075891c10.1021/jp075891c ↗
37. 10.1021/cr900201r10.1021/cr900201r ↗
38. 10.1021/ma061886f10.1021/ma061886f ↗
39. 10.1016/j.jnoncrysol.2011.10.01410.1016/j.jnoncrysol.2011.10.014 ↗