A CMOS Image Sensor Integrated with Plasmonic Colour Filters
Source abstract
Abstract
Multi-pixel, 4.5 × 9 μm, plasmonic colour filters, consisting of periodic subwavelength holes in an aluminium film, were directly integrated on the top surface of a complementary metal oxide semiconductor (CMOS) image sensor (CIS) using electron beam lithography and dry etch. The 100 × 100-pixel plasmonic CIS showed full colour sensitivities across the visible range determined by a photocurrent measurement. The filters were fabricated in a simple process utilising a single lithography step. This is to be compared with the traditional multi-step processing when using dye-doped polymers. The intrinsic compatibility of these plasmonic components with a standard CMOS process allows them to be manufactured in a metal layer close to the photodiodes. The incorporation of such plasmonic components may in the future enable the development of advanced CIS with low cost, low cross-talk and increased functionality.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Plasmonic and Surface Plasmon Research · Gold and Silver Nanoparticles Synthesis and Applications · Image Enhancement Techniques
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (21)
Show source-provided references
1. Catrysse PB, Wandell BA (2005) Roadmap for CMOS image sensors: Moore meets Planck and Sommerfeld. Proc SPIE 5678:110.1117/12.592483 ↗
2. Koo C, Kim H, Paik K, Park D, Lee K, Park Y, Moon C, Lee S, Hwang S, Lee D, Kong J (2007) Improvement of crosstalk on 5M CMOS image sensor with 1.7 × 1.7 μm2 pixels. Proc SPIE 6471:64711510.1117/12.701705 ↗
3. Hsu TH, Fang YK, Lin CY, Chen SF, Lin CS, Yaung DN, Wuu SG, Chien HC, Tseng CH, Lin JS (2004) Light guide for pixel crosstalk improvement in deep submicron CMOS image sensor. IEEE Electron Device Lett 25:2210.1109/LED.2003.821597 ↗
4. Kanamori Y, Shimono M, Hane K (2006) Fabrication of transmission colour filters using silicon subwavelength gratings on quartz substrates. IEEE Photon Technol Lett 18:2126–212810.1109/LPT.2006.883208 ↗
5. Inaba Y, Kasano M, Tanaka K, Yamaguchi T (2006) Degradation-free MOS image sensor with photonic crystal colour filter. IEEE Electron Device Lett 27:45710.1109/LED.2006.874126 ↗
6. Frey L, Parrein P, Raby J, Pellé C, Hérault D, Marty M, Michailos J (2011) Color filters including infrared cut-off integrated on CMOS image sensor. Opt Express 19:1307310.1364/OE.19.013073 ↗
7. Ghaemi HF, Thio T, Grupp DE, Ebbesen TW, Lezec HJ (1998) Surface plasmons enhance optical transmission through subwavelength holes. Phys Rev B 58:6779–678210.1103/PhysRevB.58.6779 ↗
8. Lee H-S, Yoon Y-T, Lee S-S, Kim S-H, Lee K-D (2007) Colour filter based on a subwavelength patterned metal grating. Opt Express 15:15457–1546310.1364/OE.15.015457 ↗
9. Chen Q, Cumming DRS (2010) High transmission and low colour cross-talk plasmonic colour filters using triangular-lattice hole arrays in aluminium films. Opt Express 18:1405610.1364/OE.18.014056 ↗
10. Xu T, Wu Y, Luo X, Guo LJ (2010) Plasmonic nanoresonators for high-resolution colour filtering and spectral imaging. Nat Commun 1:5910.1038/ncomms1058 ↗
11. Catrysse PB, Wandell BA (2003) Integrated colour pixels in 0.18 μm complementary metal oxide semiconductor technology. J Opt Soc Am A 20:229310.1364/JOSAA.20.002293 ↗
12. Catrysse PB (2005) Monolithic integration of electronics and sub-wavelength metal optics in deep submicron CMOS technology. Mater Res Soc Symp Proc 869:5310.1557/PROC-869-D1.5 ↗
13. Yoon Y, Lee S, Lee B (2010) Visible filter integrated with an image sensor fabricated by a 90-nm standard CMOS process. LEOS, ThJ2.10.1109/PHOTONICS.2010.5699045 ↗
14. Tang L, Latif S, Miller DAB (2009) Plasmonic device in silicon CMOS. Electron Lett 45(13)10.1049/el.2009.0839 ↗
15. Chen Q, Chitnis D, Walls K, Drysdale TD, Collins S, Cumming DRS (2012) CMOS photo detectors integrated with plasmonic colour filters. IEEE Photonic Technol Lett 24:19710.1109/LPT.2011.2176333 ↗
16. Genet C, Ebbesen TW (2007) Light in tiny holes. Nature 445:39–4610.1038/nature05350 ↗
17. Barnes WL, Dereux A, Ebbesen TW (2003) Surface plasmon subwavelength optics. Nature 424:824–83010.1038/nature01937 ↗
18. Das D, Collins S (2010) A wide dynamic range integrating pixel with an improved low light sensitivity. Proc ISCAS 2010, pp. 4261–426410.1109/ISCAS.2010.5537566 ↗
19. CIE free documents for download: CIE 1931 standard colorimetric observer data. http://www.cie.co.at/index.php/LEFTMENUE/index.php?i_ca_id=298 . Accessed 21 March 2012
20. Krishnan A, Thio T, Kim TJ, Lezec HJ, Ebbesen TW, Wolff PA, Pendry J, Martin-Moreno L, Garcia-Vidal FJ (2001) Evanescently coupled resonance in surface plasmon enhanced transmission. Opt Commun 200:110.1016/S0030-4018(01)01558-9 ↗
21. Schaadt DM, Feng B, Yu ET (2005) Enhanced semiconductor optical absorption via surface plasmon excitation in metal naonparticles. Appl Phys Lett 86:06310610.1063/1.1855423 ↗