Retraction of “N 2 /H 2 Plasma-Enhanced Atomic Layer Deposition for SiO 2 Gap Filling: Implications for Nanoelectronics in Semiconductor Manufacturing”
Source abstract
Abstract
[This retracts the article DOI: 10.1021/acsanm.4c06844.].
Only a short abstract or summary was supplied by the source.
Source: openalex_inverted_index · Quality: short
Research context
OpenAlex topics: Copper Interconnects and Reliability · Semiconductor materials and devices · Plasma Diagnostics and Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References
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