journal article·2021-01-25Open access

Electronic correlations in the semiconducting half-Heusler compound FeVSb

Estiaque H. Shourov, Patrick J. Strohbeen, Dongxue Du, Abhishek Sharan, Felipe C. de Lima, Fanny Rodolakis, Jessica L. McChesney, Vincent Yannello, Anderson Janotti, Turan Birol, Jason K. Kawasaki

Physical Review B· Volume 103· Issue 4

Abstract

Electronic correlations are crucial to the low-energy physics of metallic systems with localized $d$ and $f$ states; however, their effect on band insulators and semiconductors is typically negligible. Here, we measure the electronic structure of the half-Heusler compound FeVSb, a band insulator with a filled shell configuration of 18 valence electrons per formula unit (${s}2{p}6{d}10$). Angle-resolved photoemission spectroscopy reveals a mass renormalization of ${m}*/{m}_{\text{bare}}=1.4$, where ${m}*$ is the measured effective mass and ${m}_{\text{bare}}$ is the mass from density functional theory calculations with no added on-site Coulomb repulsion. Our measurements are in quantitative agreement with dynamical mean-field theory calculations, highlighting the many-body origin of the mass renormalization. This mass renormalization lies in dramatic contrast to other filled shell intermetallics, including the thermoelectric materials CoTiSb and NiTiSn, and has a similar origin to that in FeSi, where Hund's coupling induced fluctuations across the gap can explain a dynamical self-energy and correlations. Our work calls for a rethinking of the role of correlations and Hund's coupling in intermetallic band insulators.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Heusler alloys: electronic and magnetic properties · Advanced Thermoelectric Materials and Devices · 2D Materials and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Materials Science and Engineering, University of Wisconsin–Madison, Madison, Wisconsin 53706, USA

Department of Physics, University of Delaware, Newark, Delaware 19716, USA

Federal University of Uberlândia, C.P. 593, 38400-902 Uberlândia, Minas Gerais, Brazil

Advanced Photon Source, Argonne National Laboratory, Lemont, Illinois 60439, USA

Department of Chemistry, University of Tampa, Tampa, Florida 33620, USA

Materials Science and Engineering, University of Delaware, Newark, Delaware 19716, USA

Chemical Engineering and Materials Science, University of Minnesota Twin Cities, Minneapolis, Minnesota 55455, USA

Funding

National Science Foundation · U.S. Department of Energy · Argonne National Laboratory · University of Minnesota

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