journal article·2023-07-14Open access

Different Doping Behaviors of Silicon in Zinc Blende and Wurtzite GaAs Nanowires: Implications for Crystal-Phase Device Design

Qichao Hou, H. Aruni Fonseka, Faustino Martelli, Barbara Paci, Anders Gustafsson, James A. Gott, Hui Yang, Suguo Huo, Xuezhe Yu, Lulu Chen, Yanmeng Chu, Chaofei Zha, Zheyu Zhang, Linjun Zhang, Fuxiang Shang, Wenzhang Fang, Zhiyuan Cheng, Ana M. Sanchez, Huiyun Liu, Yunyan Zhang

ACS Applied Nano Materials· Volume 6· Issue 13

Abstract

Crystal-phase engineering between zinc blende (ZB) and wurtzite (WZ) structures is becoming an important method in designing unique optoelectronic and electronic semiconductor devices. Doping to engineer their electric properties is thus of critical importance, but a direct experimental comparison in doping these two crystal structures is still missing. Nanowires (NWs) allow the coexistence of both structures due to their special growth mode. The differences in dopant incorporation between the two phases are studied here in GaAs NW shells that are coherently grown around the NWs, hence maintaining the crystal structure of the core. The Si dopant is observed to have a higher incorporation efficiency into the WZ structure due to a 2 times lower incorporation energy compared with that of the ZB structure. Besides, it can also be predicted that Si is more inclined toward Ga sites in both structures. Indeed, the As-site doping energy of the WZ structure is several orders of magnitude higher than that of Ga sites, allowing a lower doping compensation effect. This work provides useful information for doping control and hence designing crystal-phase devices.
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Research context

OpenAlex topics: Nanowire Synthesis and Applications · ZnO doping and properties · Semiconductor materials and interfaces

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

School of Micro-Nano Electronics, Zhejiang University, Hangzhou, Zhejiang 311200, China

ZJU-Hangzhou Global Scientific and Technological Innovation Center, Hangzhou, Zhejiang 311200, China

Department of Physics, University of Warwick, Coventry CV4 7AL, United Kingdom

Istituto per la Microelettronica e i Microsistemi, IMM-CNR, via fosso del cavaliere 100, 00133 Roma, Italy

Istituto di Struttura della Materia, ISM-CNR, via fosso del cavaliere 100, 00133 Roma, Italy

Solid State Physics and NanoLund, Lund University, Box 118, SE-221 00 Lund, Sweden

Department of Materials, Imperial College London, Exhibition Road, London SW7 2AZ, United Kingdom

China Tower Corporation Limited, No. 9 Dongran North Street, Beijing 100195, China

London Centre for Nanotechnology, University College London, London WC1H 0AH, United Kingdom

Department of Electronic and Electrical Engineering, University College London, London WC1E 7JE, United Kingdom

State Key Laboratory of Information Photonics and Optical Communications, Beijing University of Posts and Telecommunications, Beijing 100876, China

Department of Polymer Science and Engineering, Zhejiang University, Hangzhou, Zhejiang 310013, China

Funding

Engineering and Physical Sciences Research Council · Leverhulme Trust · EPSRC National Epitaxy Facility

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