Critical Behavior in Au Nanoparticle Arrays: Implications for All-Metal Field Effect Transistors with Ultra-high Gain at Room Temperature
Source abstract
Abstract
The working principle of large-area, open-gate field effect transistors (ogFETs) is attractive for the high-sensitivity detection of chemicals and interfacing with single cells. We describe an ogFET composed of a self-assembled, two-dimensional (2D) random network of 1D chains of 10 nm Au particles spanning over 25 μm. The device has a gating gain of 103-fold at room temperature (RT) compared to <50% for reported nanoparticle arrays at RT. The current, I ∼ (V – VT)ζ, is functionally identical to the Coulomb blockade (CB) effect observed at cryogenic temperatures, and the conductance gap, VT, at room temperature cannot be attributed to local charging for large particles (>5 nm). Surprisingly, unlike the effect observed in CB, the VT remains invariant over a large gating potential 0–25 V, leading to a universal behavior where all the I–V curves collapse into a single master curve. We explain the universality as a classical critical behavior by quantitatively mapping the percolation path in real-space images. The paths evolve as self-similar percolation channels in a fractal dimension of 1.88. The device principle enables a 103-fold gating gain in all-metallic nanoparticle arrays at RT and will potentially lead to ogFET sensors and electrochemical devices with liquid-gate junctions. The critical behavior with bias may serve as a model system to study the electronic transport in these exotic systems.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Advanced Memory and Neural Computing · Quantum and electron transport phenomena · Semiconductor materials and devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Chemical Engineering, University of Nebraska−Lincoln, Lincoln, Nebraska 68588, United States
Vajra Instruments, Lincoln, Nebraska 68512, United States
Nebraska Center Materials and Nanoscience, University of Nebraska−Lincoln, Lincoln, Nebraska 68588, United States
Funding
Army Research Office
References (37)
Show source-provided references
1. 10.1109/5.75251810.1109/5.752518 ↗
2. 10.1103/RevModPhys.79.46910.1103/RevModPhys.79.469 ↗
3. 10.1021/cr068013410.1021/cr0680134 ↗
4. 10.1103/PhysRevLett.22.137110.1103/PhysRevLett.22.1371 ↗
5. 10.1103/PhysRevLett.59.10910.1103/PhysRevLett.59.109 ↗
6. 10.1109/TMAG.1987.106500110.1109/TMAG.1987.1065001 ↗
7. 10.1209/0295-5075/10/8/01110.1209/0295-5075/10/8/011 ↗
8. 10.1103/PhysRevLett.71.319810.1103/PhysRevLett.71.3198 ↗
9. 10.1209/0295-5075/4/11/00310.1209/0295-5075/4/11/003 ↗
10. 10.1103/PhysRevLett.87.18680710.1103/PhysRevLett.87.186807 ↗
11. 10.1103/PhysRevLett.90.04680210.1103/PhysRevLett.90.046802 ↗
12. 10.1021/nl061656e10.1021/nl061656e ↗
13. 10.1166/jcsmd.2016.109410.1166/jcsmd.2016.1094 ↗
14. 10.1143/JPSJ.80.11470410.1143/JPSJ.80.114704 ↗
15. 10.1002/1521-4095(200101)13:2<109::AID-ADMA109>3.0.CO;2-Y10.1002/1521-4095(200101)13:2<109::AID-ADMA109>3.0.CO;2-Y ↗
16. 10.1063/1.150639910.1063/1.1506399 ↗
17. 10.1002/adma.20070099910.1002/adma.200700999 ↗
18. 10.1021/nn403165q10.1021/nn403165q ↗
19. 10.1021/acs.jpcc.9b0552710.1021/acs.jpcc.9b05527 ↗
20. 10.1002/admt.20200009010.1002/admt.202000090 ↗
21. 10.1103/PhysRevLett.92.07680110.1103/PhysRevLett.92.076801 ↗
22. 10.1021/nn901161w10.1021/nn901161w ↗
23. 10.1002/(SICI)1521-4095(199812)10:17<1487::AID-ADMA1487>3.0.CO;2-W10.1002/(SICI)1521-4095(199812)10:17<1487::AID-ADMA1487>3.0.CO;2-W ↗
24. 10.1039/C6NR02489K10.1039/C6NR02489K ↗
25. 10.1021/jp036357h10.1021/jp036357h ↗
26. 10.1126/sciadv.160319110.1126/sciadv.1603191 ↗
27. 10.1021/nn405437z10.1021/nn405437z ↗
28. 10.1021/acsnano.6b0029910.1021/acsnano.6b00299 ↗
29. 10.1021/la902119510.1021/la9021195 ↗
30. 10.1103/PhysRevE.62.312510.1103/PhysRevE.62.3125 ↗
31. 10.1103/PhysRevE.54.537010.1103/PhysRevE.54.5370 ↗
32. 10.1103/PhysRevLett.95.07680610.1103/PhysRevLett.95.076806 ↗
33. 10.1103/PhysRevB.71.06420610.1103/PhysRevB.71.064206 ↗
34. 10.1088/0953-8984/22/16/16320110.1088/0953-8984/22/16/163201 ↗
35. Kasap S. O. · 2006
36. Zallen R. · 2008
37. 10.1039/C4CP05964F10.1039/C4CP05964F ↗