Source abstract
Abstract
Coupling the plasmonic metals with semiconductors often induces strong charge and energy transfer across heterointerfaces, offering an unprecedented opportunity to break the fundamental limit of semiconductor optoelectronic devices. Herein, we demonstrate a broadened photodetection bandwidth with drastically enhanced photoresponsivity of photoelectrochemical cells by coupling the plasmonic–platinum nanoparticles with p-type AlGaN-semiconductor nanostructures. Benefiting from the localized surface plasmon resonance at the platinum-AlGaN nanostructure interface, our devices exhibit a striking 3 orders of magnitude boost of the photoresponsivity in the visible band, which is barely attainable in pristine wide band gap semiconductors. Simultaneously, a nearly sevenfold enhancement of the photoresponsivity can also be achieved under 254 nm light illumination, demonstrating high-responsive deep ultraviolet-sensitive broad-bandwidth photodetection. Most importantly, the proposed plasmon-induced metal/semiconductor hybrid nanoarchitectures, by embracing a diversity of plasmonic metals combined with the wide tunable band gap of the group III-nitride semiconductors via synergy of the plasmonic–photoelectric effect, show significant promise in designing specific wavelength-dominance broadband photosensing systems of the future.
Source: openalex_inverted_index · Quality: baseline
Affiliations
School of Microelectronics, University of Science and Technology of China, Hefei 230026, P. R. China
Computer, Electrical, and Mathematical Sciences and Engineering Division, King Abdullah University of Science and Technology, Thuwal 23955-6900, Saudi Arabia
Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, Hong Kong SAR 999077, P. R. China
Funding
City University of Hong Kong · National Natural Science Foundation of China · Fundamental Research Funds for the Central Universities · USTC Research Funds of the Double First-Class Initiative