Ultrahigh-printing-speed photoresists for additive manufacturing
Source abstract
Abstract
Printing technology for precise additive manufacturing at the nanoscale currently relies on two-photon lithography. Although this methodology can overcome the Rayleigh limit to achieve nanoscale structures, it still operates at too slow of a speed for large-scale practical applications. Here we show an extremely sensitive zirconium oxide hybrid-(2,4-bis(trichloromethyl)-6-(4-methoxystyryl)-1,3,5-triazine) (ZrO2-BTMST) photoresist system that can achieve a printing speed of 7.77 m s-1, which is between three and five orders of magnitude faster than conventional polymer-based photoresists. We build a polygon laser scanner-based two-photon lithography machine with a linear stepping speed approaching 10 m s-1. Using the ZrO2-BTMST photoresist, we fabricate a square raster with an area of 1 cm2 in ~33 min. Furthermore, the extremely small chemical components of the ZrO2-BTMST photoresist enable high-precision patterning, leading to a line width as small as 38 nm. Calculations assisted by characterizations reveal that the unusual sensitivity arises from an efficient light-induced polarity change of the ZrO2 hybrid. We envisage that the exceptional sensitivity of our organic-inorganic hybrid photoresist may lead to a viable large-scale additive manufacturing nanofabrication technology.
Source: europepmc · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Nonlinear Optical Materials Studies · Nanofabrication and Lithography Techniques · Luminescence and Fluorescent Materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (68)
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1. Erkal, J. L. et al. 3D printed microfluidic devices with integrated versatile and reusable electrodes. Lab Chip 14, 2023–2032 (2014).10.1039/C4LC00171K ↗
2. Huang, T. Y. et al. 3D printed microtransporters: compound micromachines for spatiotemporally controlled delivery of therapeutic agents. Adv. Mater. 27, 6644–6650 (2015).10.1002/adma.201503095 ↗
3. von Freymann, G. et al. Three-dimensional nanostructures for photonics. Adv. Funct. Mater. 20, 1038–1052 (2010).10.1002/adfm.200901838 ↗
4. Xiong, W. et al. Laser-directed assembly of aligned carbon nanotubes in three dimensions for multifunctional device fabrication. Adv. Mater. 28, 2002–2009 (2016).10.1002/adma.201505516 ↗
5. Zhang, W. et al. 3D printed micro-electrochemical energy storage devices: from design to integration. Adv. Funct. Mater. 31, 2104909 (2021).10.1002/adfm.202104909 ↗
6. Wei, T. S., Ahn, B. Y., Grotto, J. & Lewis, J. A. 3D printing of customized Li-ion batteries with thick electrodes. Adv. Mater. 30, 1703027 (2018).10.1002/adma.201703027 ↗
7. Symes, M. D. et al. Integrated 3D-printed reactionware for chemical synthesis and analysis. Nat. Chem. 4, 349–354 (2012).10.1038/nchem.1313 ↗
8. Derby, B. Printing and prototyping of tissues and scaffolds. Science 338, 921–926 (2012).10.1126/science.1226340 ↗
9. Lee, A. et al. 3D bioprinting of collagen to rebuild components of the human heart. Science 365, 482–487 (2019).10.1126/science.aav9051 ↗
10. Kawata, S., Sun, H. B., Tanaka, T. & Takada, K. Finer features for functional microdevices. Nature 412, 697–698 (2001).10.1038/35089130 ↗
11. Regehly, M. et al. Xolography for linear volumetric 3D printing. Nature 588, 620–624 (2020).10.1038/s41586-020-3029-7 ↗
12. Guo, L. J. Nanoimprint lithography: methods and material requirements. Adv. Mater. 19, 495–513 (2007).10.1002/adma.200600882 ↗
13. Tumbleston, J. R. et al. Continuous liquid interface production of 3D objects. Science 347, 1349–1352 (2015).10.1126/science.aaa2397 ↗
14. Tseng, A. A., Notargiacomo, A. & Chen, T. P. Nanofabrication by scanning probe microscope lithography: a review. J. Vac. Sci. Technol. B 23, 877–894 (2005).10.1116/1.1926293 ↗
15. Arnoux, C. et al. Polymerization photoinitiators with near-resonance enhanced two-photon absorption cross-section: toward high-resolution photoresist with improved sensitivity. Macromolecules 53, 9264–9278 (2020).10.1021/acs.macromol.0c01518 ↗
16. Gan, Z., Cao, Y., Evans, R. A. & Gu, M. Three-dimensional deep sub-diffraction optical beam lithography with 9 nm feature size. Nat. Commun. 4, 2061 (2013).10.1038/ncomms3061 ↗
17. Jin, F. et al. λ/30 inorganic features achieved by multi-photon 3D lithography. Nat. Commun. 13, 1357 (2022).10.1038/s41467-022-29036-7 ↗
18. Portela, C. M. et al. Supersonic impact resilience of nanoarchitected carbon. Nat. Mater. 20, 1491–1497 (2021).10.1038/s41563-021-01033-z ↗
19. Geng, Q., Wang, D., Chen, P. & Chen, S. C. Ultrafast multi-focus 3-D nano-fabrication based on two-photon polymerization. Nat. Commun. 10, 2179 (2019).10.1038/s41467-019-10249-2 ↗
20. Oakdale, J. S. et al. Direct laser writing of low-density interdigitated foams for plasma drive shaping. Adv. Funct. Mater. 27, 1702425 (2017).10.1002/adfm.201702425 ↗
21. Fischer, J. et al. Three-dimensional multi-photon direct laser writing with variable repetition rate. Opt. Express 21, 26244–26260 (2013).10.1364/OE.21.026244 ↗
22. Meza, L. R., Das, S. & Greer, J. R. Strong, lightweight, and recoverable three-dimensional ceramic nanolattices. Science 345, 1322–1326 (2014).10.1126/science.1255908 ↗
23. Malinauskas, M., Zukauskas, A., Bickauskaite, G., Gadonas, R. & Juodkazis, S. Mechanisms of three-dimensional structuring of photo-polymers by tightly focussed femtosecond laser pulses. Opt. Express 18, 10209–10221 (2010).10.1364/OE.18.010209 ↗
24. Shaw, L. A. et al. Scanning two-photon continuous flow lithography for synthesis of high-resolution 3D microparticles. Opt. Express 26, 13543–13548 (2018).10.1364/OE.26.013543 ↗
25. Ito, H. Chemical amplification resists for microlithography. Adv. Polym. Sci. 172, 37–245 (2005).10.1007/b97574 ↗
26. Ito, H. Chemical amplification resists: inception, implementation in device manufacture, and new developments. J. Polym. Sci. A 41, 3863–3870 (2003).10.1002/pola.10963 ↗
27. Ito, H. Chemical amplification resists: History and development within IBM. IBM J. Res. Dev. 41, 69–80 (1997).10.1147/rd.411.0069 ↗
28. Bourzac, K. A giant bid to etch tiny circuits. Nature 487, 419 (2012).10.1038/487419a ↗
29. Lithography roadmap on track. Nat. Photon. 4, 20 (2010).10.1038/nphoton.2009.253 ↗
30. Totzeck, M., Ulrich, W., Göhnermeier, A. & Kaiser, W. Pushing deep ultraviolet lithography to its limits. Nat. Photon. 1, 629–631 (2007).10.1038/nphoton.2007.218 ↗
31. Trikeriotis, M. et al. Nanoparticle photoresists from HfO2 and ZrO2 for EUV patterning. J. Photopolym. Sci. Technol. 25, 583–586 (2012).10.2494/photopolymer.25.583 ↗
32. Jiang, J., Chakrabarty, S., Yu, M. & Ober, C. K. Metal oxide nanoparticle photoresists for EUV patterning. J. Photopolym. Sci. Technol. 27, 663–666 (2014).10.2494/photopolymer.27.663 ↗
33. Xu, H. et al. Metal-organic framework-inspired metal-containing clusters for high-resolution patterning. Chem. Mater. 30, 4124–4133 (2018).10.1021/acs.chemmater.8b01573 ↗
34. Tanaka, H., Matsumoto, A., Akinaga, K., Takahashi, A. & Okada, T. Comparative study on emission characteristics of extreme ultraviolet radiation from CO2 and Nd:YAG laser-produced tin plasmas. Appl. Phys. Lett. 87, 041503 (2005).10.1063/1.1989441 ↗
35. Service, R. F. Optical lithography goes to extremes-and beyond. Science 293, 785–786 (2001).10.1126/science.293.5531.785 ↗
36. The shrinking chip. Nat. Photonics 3, 485 (2009).10.1038/nphoton.2009.145 ↗
37. Xu, H., Kosma, V., Giannelis, E. P. & Ober, C. K. In pursuit of Moore’s Law: polymer chemistry in action. Polym. J. 50, 45–55 (2018).10.1038/pj.2017.64 ↗
38. Rayleigh, L. On the theory of optical images, with special reference to the microscope. J. R. Microsc. Soc. 42, 167–195 (2011).
39. Wagner, C. & Harned, N. Lithography gets extreme. Nat. Photon. 4, 24–26 (2010).10.1038/nphoton.2009.251 ↗
40. Sanders, D. P. Advances in patterning materials for 193 nm immersion lithography. Chem. Rev. 110, 321–360 (2010).10.1021/cr900244n ↗
41. Pohlers, G., Scaiano, J. C., Step, E. & Sinta, R. Ionic vs free radical pathways in the direct and sensitized photochemistry of 2-(4′-methoxynaphthyl)-4,6-bis(trichloromethyl)-1,3,5-triazine: relevance for photoacid generation. J. Am. Chem. Soc. 121, 6167–6175 (1999).10.1021/ja983371c ↗
42. Pohlers, G., Scaiano, J. C., Sinta, R., Brainard, R. & Pai, D. Mechanistic studies of photoacid generation from substituted 4,6-bis(trichloromethyl)-1,3,5-triazines. Chem. Mater. 9, 1353–1361 (1997).10.1021/cm960558z ↗
43. Ligon, S. C., Husar, B., Wutzel, H., Holman, R. & Liska, R. Strategies to reduce oxygen inhibition in photoinduced polymerization. Chem. Rev. 114, 557–589 (2014).10.1021/cr3005197 ↗
44. Lu, W. E., Dong, X. Z., Chen, W. Q., Zhao, Z. S. & Duan, X. M. Novel photoinitiator with a radical quenching moiety for confining radical diffusion in two-photon induced photopolymerization. J. Mater. Chem. 21, 5650–5659 (2011).10.1039/c0jm04025h ↗
45. Sheik-Bahae, M., Said, A. A., Wei, T. H., Hagan, D. J. & Van Stryland, E. W. Sensitive measurement of optical nonlinearities using a single beam. IEEE J. Quantum Electron. 26, 760–769 (1990).10.1109/3.53394 ↗
46. Sheik-Bahae, M., Said, A. A. & Van Stryland, E. W. High-sensitivity, single-beam n2 measurements. Opt. Lett. 14, 955–957 (1989).10.1364/OL.14.000955 ↗
47. Buckingham, A. D., Fowler, P. W. & Hutson, J. M. Theoretical studies of van der Waals molecules and intermolecular forces. Chem. Rev. 88, 963–988 (1988).10.1021/cr00088a008 ↗
48. Berland, K. et al. Van der Waals forces in density functional theory: a review of the vdW-DF method. Rep. Prog. Phys. 78, 066501 (2015).10.1088/0034-4885/78/6/066501 ↗
49. Ouyang, W. et al. Ultrafast 3D nanofabrication via digital holography. Nat. Commun. 14, 1716 (2023).10.1038/s41467-023-37163-y ↗
50. Saha, S. K. et al. Scalable submicrometer additive manufacturing. Science 366, 105–109 (2019).10.1126/science.aax8760 ↗
51. Sheng, L. et al. Suppressing electrolyte-lithium metal reactivity via Li+-desolvation in uniform nano-porous separator. Nat. Commun. 13, 172 (2022).10.1038/s41467-021-27841-0 ↗
52. Hohenberg, P. & Kohn, W. Inhomogeneous electron gas. Phys. Rev. B 136, B864–B871 (1964).10.1103/PhysRev.136.B864 ↗
53. Kohn, W. & Sham, L. J. Self-consistent equations including exchange and correlation effects. Phys. Rev. 140, 1133–1138 (1965).10.1103/PhysRev.140.A1133 ↗
54. Andzelm, J., Kolmel, C. & Klamt, A. Incorporation of solvent effects into density functional calculations of molecular energies and geometries. J. Chem. Phys. 103, 9312–9320 (1995).10.1063/1.469990 ↗
55. Klamt, A., Jonas, V., Burger, T. & Lohrenz, J. C. W. Refinement and parametrization of COSMO-RS. J. Phys. Chem. A 102, 5074–5085 (1998).10.1021/jp980017s ↗
56. Mullins, E. et al. Sigma-profile database for using COSMO-based thermodynamic methods. Ind. Eng. Chem. Res. 45, 4389–4415 (2006).10.1021/ie060370h ↗
57. Mullins, E., Liu, Y. A., Ghaderi, A. & Fast, S. D. Sigma profile database for predicting solid solubility in pure and mixed solvent mixtures for organic pharmacological compounds with COSMO-based thermodynamic methods. Ind. Eng. Chem. Res. 47, 1707–1725 (2008).10.1021/ie0711022 ↗
58. Delley, B. An all-electron numerical method for solving the local density functional for polyatomic molecules. J. Chem. Phys. 92, 508–517 (1990).10.1063/1.458452 ↗
59. Delley, B. From molecules to solids with the DMol3 approach. J. Chem. Phys. 113, 7756–7764 (2000).10.1063/1.1316015 ↗
60. Zhao, Y. & Truhlar, D. G. A new local density functional for main-group thermochemistry, transition metal bonding, thermochemical kinetics, and noncovalent interactions. J. Chem. Phys. 125, 194101 (2006).10.1063/1.2370993 ↗
61. Perdew, J. P., Burke, K. & Ernzerhof, M. Generalized gradient approximation made simple. Phys. Rev. Lett. 77, 3865–3868 (1996).10.1103/PhysRevLett.77.3865 ↗
62. Adamo, C. & Barone, V. Toward reliable density functional methods without adjustable parameters: the PBE0 model. J. Chem. Phys. 110, 6158–6170 (1999).10.1063/1.478522 ↗
63. Ernzerhof, M. & Scuseria, G. E. Assessment of the Perdew–Burke–Ernzerhof exchange-correlation functional. J. Chem. Phys. 110, 5029–5036 (1999).10.1063/1.478401 ↗
64. Weigend, F. & Ahlrichs, R. Balanced basis sets of split valence, triple zeta valence and quadruple zeta valence quality for H to Rn: design and assessment of accuracy. Phys. Chem. Chem. Phys. 7, 3297–3305 (2005).10.1039/b508541a ↗
65. Weigend, F. Accurate Coulomb-fitting basis sets for H to Rn. Phys. Chem. Chem. Phys. 8, 1057–1065 (2006).10.1039/b515623h ↗
66. Marenich, A. V., Cramer, C. J. & Truhlar, D. G. Universal solvation model based on solute electron density and on a continuum model of the solvent defined by the bulk dielectric constant and atomic surface tensions. J. Phys. Chem. B 113, 6378–6396 (2009).10.1021/jp810292n ↗
67. Frisch, M. J. et al. Gaussian 16 Revision C (Gaussian, 2016).
68. Lu, T. & Chen, F. Multiwfn: a multifunctional wavefunction analyzer. J. Comput. Chem. 33, 580–592 (2012).10.1002/jcc.22885 ↗