Prediction of electrical properties of GAAFET based on integrated learning model
Source abstract
Abstract
Abstract As device feature sizes continue to decrease and fin field effect transistors reach their physical limits, gate all around field effect transistors (GAAFETs) have emerged with larger gate control areas and stackable characteristics for better suppression of second-order effects such as short-channel effects due to their gate encircling characteristics. Traditional methods for studying the electrical characteristics of devices are mostly based on the technology computer-aided design. Still, it is not conducive to developing new devices due to its time-consuming and inefficient drawbacks. Deep learning (DL) and machine learning (ML) have been well-used in recent years in many fields. In this paper, we propose an integrated learning model that integrates the advantages of DL and ML to solve many problems in traditional methods. This integrated learning model predicts the direct current characteristics, capacitance characteristics, and electrical parameters of GAAFET better than those predicted by DL or ML methods alone, with a linear regression factor (R 2) greater than 0.99 and very small root mean square error. The proposed integrated learning model achieves fast and accurate prediction of GAAFET electrical characteristics, which provides a new idea for device and circuit simulation and characteristics prediction in microelectronics.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Industrial Vision Systems and Defect Detection
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (23)
Show source-provided references
1. Short-channel effect in fully depleted SOI MOSFETs10.1109/16.19942 ↗
2. Hu · 2010 · vol 2 · 9
3. Sub-50 nm p-channel FinFET10.1109/16.918235 ↗
4. Increased drain-induced variability and within-device variability in extremely narrow silicon nanowire MOSFETs with Width down to 2 nm10.1109/SNW.2016.7578021 ↗
5. A unified 3D device simulation of random dopant, interface trap and work function fluctuations on high K metal gate device10.1109/IEDM.2011.6131495 ↗
6. Introducing technology computer-aided design (TCAD)10.1201/9781315364506 ↗
7. 3D device simulation of work function and interface trap fluctuations on high-kappa/metal gate devices10.1109/IEDM.2010.5703370 ↗
8. TCAD study on gate-all-around cylindrical (GAAC) transistor for CMOS scaling to the end of the roadmap10.1016/j.mejo.2009.09.008 ↗
9. TCAD based performance analysis of junctionless cylindrical double gate all around FET up to 5 nm technology node10.1109/ICCITECHN.2017.8281858 ↗
10. TCAD-based assessment of the lateral GAA nanosheet transistor for future CMOS10.1109/TED.2021.3124472 ↗
11. Deep learning in neural networks: an overview10.1016/j.neunet.2014.09.003 ↗
12. Machine learning algorithms—a review
13. A machine learning approach to modeling intrinsic parameter fluctuation of gate-all-around Si nanosheet MOSFETs10.1109/ACCESS.2022.3188690 ↗
14. Machine learning aided device simulation of work function fluctuation for multichannel gate-all-around silicon nanosheet MOSFETs10.1109/TED.2021.3084910 ↗
15. Deep learning algorithms for the work function fluctuation of random nanosized metal grains on gate-all-around silicon nanowire MOSFETs10.1109/ACCESS.2021.3079981 ↗
16. Deep learning approach to estimating work function fluctuation of gate-all-around silicon nanosheet MOSFETs with a ferroelectric HZO layer10.1109/EDTM53872.2022.9798172 ↗
17. Silicon-on-insulatortechnology10.1049/ip-e.1986.0014 ↗
18. Gate-channel capacitance characteristics in the fully-depleted SOI MOSFET10.1109/16.902743 ↗
19. A review of data classification using k-nearest neighbour algorithm
20. Information computing and applications10.1007/978-3-642-34062-8_32 ↗
21. Ensemble selection from libraries of models10.1145/1015330.1015432 ↗
22. Kingma · 2014
23. Prediction of electrical properties of FDSOI devices based on deep learning10.1088/1361-6528/ac6c95 ↗