Correction: Strain mapping inside an individual processed vertical nanowire transistor using scanning X-ray nanodiffraction
Source abstract
Abstract
Correction for ‘Strain mapping inside an individual processed vertical nanowire transistor using scanning X-ray nanodiffraction’ by Dmitry Dzhigaev et al. , Nanoscale , 2020, 12 , 14487–14493, DOI: 10.1039/D0NR02260H.
Only a short abstract or summary was supplied by the source.
Source: crossref · Quality: short
Research context
OpenAlex topics: Diamond and Carbon-based Materials Research · Ion-surface interactions and analysis · Advanced ceramic materials synthesis
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Division of Synchrotron Radiation Research and NanoLund, Department of Physics, Lund University, P.O. Box 118, SE-221 00 Lund, Sweden
Electrical and Information Technology, Department of Engineering, Lund University, P.O. Box 118, SE-221 00 Lund, Sweden
MAX IV Laboratory, Lund University, 22100 Lund, Sweden
DTU CEN, DTU, Fysikvej 2800, Lyngby, Denmark
Funding
Vetenskapsrådet · Stiftelsen för Strategisk Forskning · VINNOVA · Svenska Forskningsrådet Formas
References
Reference metadata was not supplied for this record.