journal article·2025Open access

Ultra-high absorption efficiency of InN nanowires with a wide bandwidth in the short-wave infrared range

Yanmeng Chu, ZhouXiang Chen, Hanchen Zhu, Linjun Zhang, Fuxiang Shang, Qichao Hou, Lulu Chen, Wenzhang Fang, Yishu Zhang, Zhiyuan Cheng, Yunyan Zhang

Nanoscale· Volume 17· Issue 17

Abstract

The group III-V semiconductor InN is a highly promising candidate for photoelectric detectors in the short-wave infrared (SWIR) range but faces significant challenges in material quality. In recent years, one-dimensional nanowires (NWs) have allowed their high-quality growth and have added structural advantages. However, the performance potential of InN NWs is little known. Here, the optoelectrical properties of hexagonal wurtzite InN NWs were systematically studied. The high absorptivity of InN itself, along with the antenna effect and leaky model resonance, results in the InN NWs exhibiting more than 99% light absorption in the 1000-1470 nm range and a wide range of incidence angles (0-65°). The absorption of InN NW arrays with a low filling factor (FF) of 12.83% can be 34% higher than that of thin film materials of the same thickness and an additional 28% enhancement can be obtained by tilting the NWs. A remarkable response of up to 1 A W-1 can be explicitly achieved at 1550 nm with precisely arranged InN nanowire arrays. This responsivity is 11.83% higher than that of InGaAs nanowire arrays. The results indicate that InN NWs with outstanding light absorption performance can be used as an efficient photosensitive material in the SWIR range for photovoltaics, detectors, and other optoelectronic devices.
Source: europepmc · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: GaN-based semiconductor devices and materials · Nanowire Synthesis and Applications · Gas Sensing Nanomaterials and Sensors

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

College of Integrated Circuits, Zhejiang University, Hangzhou, Zhejiang 311200, China

Zhejiang Technology Innovation Center of CMOS IC Manufacturing Process and Design, Hangzhou 311200, China

Funding

National Natural Science Foundation of China · Natural Science Foundation of Zhejiang Province · Zhejiang University

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