journal article·2026-05-13

Templated Oxide Synthesis on Self-Assembled PS -b- PMMA via Atomic Layer Deposition

Wenda Bao, Yingdong Deng, Jiayi Chen, Weiyi Lin, Jin Xie, Xiaoyun Yu, Shisheng Xiong

ACS Applied Materials & Interfaces· Volume 18· Issue 18
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Abstract

Inorganic nanoarrays exhibit remarkable potential for applications in energy storage, photocatalysis, and electronics. However, methods for their direct fabrication remain limited. To address this challenge, we have developed a templated oxide synthesis (TOS) strategy using self-assembled polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) as templates. This approach enables the fabrication of a variety of inorganic oxide nanoarrays, and the process of Al2O3 is demonstrated in detail. The inorganics deposited by atomic layer deposition on the sidewalls of surface-activated PS after PMMA removal merge into dense arrays after removing the PS template by postannealing. The fabricated Al2O3 line arrays can be used as hard masks and can achieve exceptional line edge and width roughnesses of 1.6 and 1.3 nm, respectively. Furthermore, TiO2, In2O3, ZnO, and HfO2 nanoline and pillar arrays are successfully fabricated using this method. The versatility of TOS demonstrates its broad applicability for precision nanofabrication across a range of material systems.
Source: europepmc · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Anodic Oxide Films and Nanostructures · Semiconductor materials and devices · Mesoporous Materials and Catalysis

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Extreme Technology Institute

Zhangjiang Labotory

School of Physical Science and Technology

ShanghaiTech University

School of Information Science and Technology

Fudan University

Funding

National Natural Science Foundation of China (NSFC)

References (30)

Show source-provided references
1. 10.1016/S1369-7021(06)71619-410.1016/S1369-7021(06)71619-4 ↗
2. 10.1021/ma102856t10.1021/ma102856t ↗
3. 10.1002/1521-4095(200108)13:15<1152::AID-ADMA1152>3.0.CO;2-510.1002/1521-4095(200108)13:15<1152::AID-ADMA1152>3.0.CO;2-5 ↗
4. 10.1002/adfm.20190204910.1002/adfm.201902049 ↗
5. 10.1039/c1jm12461g10.1039/c1jm12461g ↗
6. 10.1016/j.progpolymsci.2015.10.00610.1016/j.progpolymsci.2015.10.006 ↗
7. 10.1088/2631-7990/aba3ae10.1088/2631-7990/aba3ae ↗
8. 10.1002/adma.20100246510.1002/adma.201002465 ↗
9. 10.1016/j.eurpolymj.2013.10.01010.1016/j.eurpolymj.2013.10.010 ↗
10. Singh, A.; Knaepen, W.; Sayan, S.; el Otell, Z.; Chan, B. T.; Maes, J. W.; Gronheid, R. Impact of Sequential Infiltration Synthesis on Pattern Fidelity of DSA Lines. In Advances in Patterning Materials and Processes XXXII ; SPIE, 2015, Vol. 9425, p 94250N.10.1117/12.2086091 ↗
11. 10.1002/admi.20180101610.1002/admi.201801016 ↗
12. 10.1021/jp511939j10.1021/jp511939j ↗
13. 10.1021/acs.chemmater.9b0171410.1021/acs.chemmater.9b01714 ↗
14. 10.1021/acs.chemmater.7b0417410.1021/acs.chemmater.7b04174 ↗
15. 10.1002/adma.20110487110.1002/adma.201104871 ↗
16. 10.1021/acsnano.5b0101310.1021/acsnano.5b01013 ↗
17. 10.1063/1.474492810.1063/1.4744928 ↗
18. 10.1038/ncomms696310.1038/ncomms6963 ↗
19. 10.1039/C9NR00206E10.1039/C9NR00206E ↗
20. 10.1039/C7MH00196G10.1039/C7MH00196G ↗
21. 10.1002/polb.2367510.1002/polb.23675 ↗
22. 10.1016/j.mee.2007.12.03710.1016/j.mee.2007.12.037 ↗
23. 10.1021/jp205532e10.1021/jp205532e ↗
24. 10.1063/1.512810810.1063/1.5128108 ↗
25. 10.1021/acsapm.8b0013810.1021/acsapm.8b00138 ↗
26. 10.1016/j.jcis.2019.09.04410.1016/j.jcis.2019.09.044 ↗
27. 10.1039/C7NR07642H10.1039/C7NR07642H ↗
28. 10.1021/nn304122b10.1021/nn304122b ↗
29. 10.1021/nn200323410.1021/nn2003234 ↗
30. 10.1021/jp511939j10.1021/jp511939j ↗