journal article·2024

Mitigating substrate effects of van der Waals semiconductors using perfluoropolyether self-assembled monolayers

Dae Young Park, Hyeong Chan Suh, Seungho Bang, Ju Chan Lee, Jaekak Yoo, Hayoung Ko, Soo Ho Choi, Ki Kang Kim, Seung Mi Lee, Seong Chu Lim, Tschang-Uh Nahm, Mun Seok Jeong

Nanoscale· Volume 16· Issue 22
Publisher page

Abstract

The properties of transition metal dichalcogenides (TMDCs) are critically dependent on the dielectric constant of substrates, which significantly limits their application. To address this issue, we used a perfluorinated polyether (PFPE) self-assembled monolayer (SAM) with low surface energy to increase the van der Waals (vdW) gap between TMDCs and the substrate, thereby reducing the interaction between them. This resulted in a reduction in the subthreshold swing value, an increase in the photoluminescence intensity of excitons, and a decrease in the doping effect by the substrate. This work will provide a new way to control the TMDC/dielectric interface and contribute to expanding the applicability of TMDCs.
Source: openalex_inverted_index · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: 2D Materials and Applications · Graphene research and applications · Nanowire Synthesis and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Physics, Hanyang University, Seoul 04763, Republic of Korea

Department of Energy Science, Sungkyunkwan University, Suwon 16419, Republic of Korea

Korea Research Institute of Standards and Science, Daejeon 34114, Republic of Korea

Funding

Ministry of Trade, Industry and Energy · National Research Foundation of Korea · National Research Council of Science and Technology

References (47)

Show source-provided references
1. Bang · Nano Lett. · 2018 · 18 · 231610.1021/acs.nanolett.7b05060 ↗
2. Lopez-Sanchez · Nat. Nanotechnol. · 2013 · 8 · 49710.1038/nnano.2013.100 ↗
3. Radisavljevic · Nat. Nanotechnol. · 2011 · 6 · 14710.1038/nnano.2010.279 ↗
4. Lee · Adv. Funct. Mater. · 2022 · 32 · 210567510.1002/adfm.202105675 ↗
5. Lee · ACS Appl. Mater. Interfaces · 2020 · 12 · 3571610.1021/acsami.0c09285 ↗
6. Cho · ACS Nano · 2019 · 13 · 971310.1021/acsnano.9b02540 ↗
7. Kim · npj 2D Mater. Appl. · 2021 · 5 · 110.1038/s41699-020-00191-z ↗
8. Liu · Nat. Electron. · 2021 · 4 · 34210.1038/s41928-021-00566-0 ↗
9. Fan · J. Phys. Chem. C · 2011 · 115 · 1296010.1021/jp202273a ↗
10. Zhang · Nat. Phys. · 2009 · 5 · 72210.1038/nphys1365 ↗
11. Jeong · Adv. Mater. · 2017 · 29 · 170030810.1002/adma.201700308 ↗
12. Chen · Semicond. Sci. Technol. · 2018 · 33 · 02400110.1088/1361-6641/aaa222 ↗
13. Wierzbowski · Sci. Rep. · 2017 · 7 · 110.1038/s41598-017-09739-4 ↗
14. Liu · Nat. Commun. · 2019 · 10 · 110.1038/s41467-018-07882-8 ↗
15. Lee · Nanotechnology · 2018 · 29 · 33520210.1088/1361-6528/aac6b0 ↗
16. Purdie · Nat. Commun. · 2018 · 9 · 538710.1038/s41467-018-07558-3 ↗
17. Pham · Chem. Rev. · 2022 · 122 · 651410.1021/acs.chemrev.1c00735 ↗
18. Lee · Science · 2018 · 362 · 81710.1126/science.aau2132 ↗
19. Ko · 2D Mater. · 2021 · 8 · 03400310.1088/2053-1583/abf761 ↗
20. Volinsky · Acta Mater. · 2002 · 50 · 44110.1016/S1359-6454(01)00354-8 ↗
21. Deng · ACS Appl. Mater. Interfaces · 2017 · 9 · 781210.1021/acsami.6b16175 ↗
22. Huo · Food Bioprod. Process. · 2019 · 118 · 13010.1016/j.fbp.2019.09.005 ↗
23. Wang · Materials · 2020 · 13 · 168110.3390/ma13071681 ↗
24. D. D.Ebbing , S. D.Gammon and R. O.Ragsdale , Essentials of General Chemistry , Houghton Mifflin , 2006
25. Poenitzsch · J. Am. Chem. Soc. · 2007 · 129 · 1472410.1021/ja0750827 ↗
26. Liu · Adv. Mater. · 2016 · 28 · 645710.1002/adma.201504876 ↗
27. Wang · Phys. Rev. Mater. · 2019 · 3 · 08380310.1103/PhysRevMaterials.3.083803 ↗
28. Wang · Adv. Mater. · 2023 · 35 · e220937110.1002/adma.202209371 ↗
29. Petrić · Phys. Rev. B · 2021 · 103 · 03541410.1103/PhysRevB.103.035414 ↗
30. Lee · Curr. Appl. Phys. · 2023 · 49 · 11510.1016/j.cap.2023.02.018 ↗
31. Choi · Adv. Mater. · 2021 · 33 · e200660110.1002/adma.202006601 ↗
32. Mlack · Sci. Rep. · 2017 · 7 · 4303710.1038/srep43037 ↗
33. Mouri · Nano Lett. · 2013 · 13 · 594410.1021/nl403036h ↗
34. Li · ACS Appl. Mater. Interfaces · 2020 · 12 · 627610.1021/acsami.9b19864 ↗
35. Wang · Adv. Funct. Mater. · 2020 · 30 · 200284610.1002/adfm.202002846 ↗
36. Taucher · J. Phys. Chem. C · 2016 · 120 · 342810.1021/acs.jpcc.5b12387 ↗
37. Smyth · J. Phys. Chem. · 1937 · 41 · 20910.1021/j150380a004 ↗
38. Pauling · J. Am. Chem. Soc. · 1932 · 54 · 357010.1021/ja01348a011 ↗
39. Velický · Appl. Mater. Today · 2017 · 8 · 6810.1016/j.apmt.2017.05.003 ↗
40. Voß · Phys. Rev. B · 1999 · 60 · 1431110.1103/PhysRevB.60.14311 ↗
41. Perdew · Phys. Rev. Lett. · 1996 · 77 · 386510.1103/PhysRevLett.77.3865 ↗
42. Yang · ACS Appl. Mater. Interfaces · 2021 · 13 · 868210.1021/acsami.0c23058 ↗
43. Diemer · Appl. Phys. Lett. · 2015 · 107 · 10330310.1063/1.4930310 ↗
44. Aghamohammadi · ACS Appl. Mater. Interfaces · 2015 · 7 · 2277510.1021/acsami.5b02747 ↗
45. Possanner · Adv. Funct. Mater. · 2009 · 19 · 95810.1002/adfm.200801466 ↗
46. Lee · Appl. Surf. Sci. · 2023 · 613 · 15590010.1016/j.apsusc.2022.155900 ↗
47. Park · Appl. Phys. Lett. · 2016 · 108 · 08310210.1063/1.4942406 ↗