Gas-assisted blade-coating of organic semiconductors: molecular assembly, device fabrication and complex thin-film structuring
Source abstract
Abstract
The competitive performance of optoelectronic devices based on advanced organic semiconductors increasingly calls for suitably scalable processing schemes to capitalise on their application potential. With performance benchmarks typically established by spin-coating fabrication, doctor-blade deposition represents a widely available roll-to-roll-compatible means for the preparation of large-area samples and establishing the device upscaling potential. However, the inherently slower film formation kinetics often result in unfavourable active layer microstructures, requiring empirical and material-inefficient optimisation of solutions to reach the performance of spin-coated devices. Here we present a versatile approach to achieving performance parity for spin- and blade-coated devices using in situ gas-assisted drying enabled by a modular 3D-printed attachment. This is illustrated for organic photodetectors (OPDs) featuring bulk heterojunction active layers comprising blends of P3HT and PM6 polymer donors with the nonfullerene acceptor ITIC. Compared to conventionally blade-coated devices, mild drying gas pressures of 0.5-2 bar yield up to a 10-fold enhancement of specific detectivity by maximising external quantum efficiency and suppressing dark-current. Furthermore, controlling gas flux distribution enables one-step fabrication of 1D chain conformation and 2D chain orientation patterns in, respectively, PFO and P3HT:N2200 blend films, opening the possibility for high-throughput fabrication of devices with complex structured active layers.
Source: europepmc · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Organic Electronics and Photovoltaics · Semiconductor materials and devices · Organic Light-Emitting Diodes Research
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Light Technology Institute, Karlsruhe Institute of Technology, Engesser Str. 13, 76131 Karlsruhe, Germany
InnovationLab, Speyerer Str. 4, 69115 Heidelberg, Germany
Institute of Microstructure Technology, Karlsruhe Institute of Technology, Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany
Funding
Deutsche Forschungsgemeinschaft · Bundesministerium für Bildung und Forschung
References (51)
Show source-provided references
1. Du · Joule · 2019 · 3 · 21510.1016/j.joule.2018.09.001 ↗
2. Dai · Int. J. Extreme Manuf. · 2019 · 1 · 02200410.1088/2631-7990/ab263e ↗
3. Guo · Mater. Chem. Front. · 2021 · 5 · 325710.1039/D1QM00060H ↗
4. Wu · Adv. Opt. Mater. · 2022 · 10 · 210172310.1002/adom.202101723 ↗
5. Cui · Adv. Mater. · 2020 · 32 · 190820510.1002/adma.201908205 ↗
6. Gu · Nat. Commun. · 2018 · 9 · 53410.1038/s41467-018-02833-9 ↗
7. Merklein · Colloids Interfaces · 2019 · 3 · 3210.3390/colloids3010032 ↗
8. Strobel · Flexible Printed Electron. · 2019 · 4 · 04300110.1088/2058-8585/ab56dd ↗
9. Gertsen · Flexible Printed Electron. · 2020 · 5 · 01400410.1088/2058-8585/ab5f57 ↗
10. Pascual-San-José · J. Mater. Chem. A · 2019 · 7 · 2036910.1039/C9TA07361B ↗
11. Whitaker · Sustainable Energy Fuels · 2018 · 2 · 244210.1039/C8SE00368H ↗
12. Zhao · Adv. Mater. · 2022 · 210511410.1002/adma.202105114 ↗
13. Stafford · Rev. Sci. Instrum. · 2006 · 77 · 02390810.1063/1.2173072 ↗
14. Richter · Chem. Rev. · 2017 · 117 · 633210.1021/acs.chemrev.6b00618 ↗
15. Zhao · J. Mater. Chem. A · 2016 · 4 · 1603610.1039/C6TA06258J ↗
16. Ji · J. Mater. Chem. A · 2019 · 7 · 21210.1039/C8TA08873J ↗
17. Lee · ACS Nano · 2020 · 14 · 1449310.1021/acsnano.0c07488 ↗
18. Sprau · Adv. Energy Sustainability Res. · 2021 · 2 · 210004310.1002/aesr.202100043 ↗
19. Andersen · Sol. RRL · 2020 · 4 · 200024610.1002/solr.202000246 ↗
20. Pelse · Chem. Mater. · 2021 · 33 · 65710.1021/acs.chemmater.0c03971 ↗
21. Burkitt · RSC Adv. · 2019 · 9 · 3741510.1039/C9RA06631D ↗
22. Ternes · Adv. Energy Mater. · 2019 · 9 · 190158110.1002/aenm.201901581 ↗
23. Ding · Joule · 2019 · 3 · 40210.1016/j.joule.2018.10.025 ↗
24. Perevedentsev · Nat. Commun. · 2020 · 11 · 361010.1038/s41467-020-17361-8 ↗
25. Dörling · J. Mater. Chem. C · 2014 · 2 · 330310.1039/C3TC32056A ↗
26. Rödlmeier · Chem. Mater. · 2017 · 29 · 1015010.1021/acs.chemmater.7b03948 ↗
27. Perevedentsev · Adv. Opt. Mater. · 2022 · 10 · 210239710.1002/adom.202102397 ↗
28. Strobel · Adv. Mater. · 2020 · 32 · 190825810.1002/adma.201908258 ↗
29. Go · ACS Photonics · 2022 · 9 · 205610.1021/acsphotonics.2c00193 ↗
30. Belova · Sol. RRL · 2021 · 2100822
31. Qin · Adv. Mater. · 2016 · 28 · 941610.1002/adma.201601803 ↗
32. Ciammaruchi · Mater. Adv. · 2020 · 1 · 284610.1039/D0MA00458H ↗
33. Seidler · J. Mater. Chem. C · 2013 · 1 · 774810.1039/c3tc31284d ↗
34. Fox · Bull. Am. Phys. Soc. · 1956 · 1 · 123
35. Wang · Nat. Commun. · 2021 · 12 · 33210.1038/s41467-020-20515-3 ↗
36. Lochner · Nat. Commun. · 2014 · 5 · 574510.1038/ncomms6745 ↗
37. Guo · J. Mater. Chem. C · 2017 · 5 · 143610.1039/C6TC04771H ↗
38. Simone · Adv. Opt. Mater. · 2020 · 8 · 190156810.1002/adom.201901568 ↗
39. Yang · Nanoscale Res. Lett. · 2019 · 14 · 20110.1186/s11671-019-3033-8 ↗
40. Zhao · Adv. Energy Mater. · 2018 · 8 · 170314710.1002/aenm.201703147 ↗
41. Wang · J. Mater. Chem. A · 2017 · 5 · 2218010.1039/C7TA07785H ↗
42. Perevedentsev · Nat. Commun. · 2015 · 6 · 597710.1038/ncomms6977 ↗
43. Perevedentsev · J. Polym. Sci., Part B: Polym. Phys. · 2016 · 54 · 199510.1002/polb.24106 ↗
44. Perevedentsev · J. Polym. Sci., Part B: Polym. Phys. · 2015 · 53 · 148110.1002/polb.23798 ↗
45. Perevedentsev · J. Polym. Sci., Part B: Polym. Phys. · 2015 · 53 · 149210.1002/polb.23797 ↗
46. Cheetham · Chem. Mater. · 2019 · 31 · 678710.1021/acs.chemmater.9b01256 ↗
47. Shi · Phys. Rev. X · 2019 · 9 · 021038
48. Perevedentsev · J. Polym. Sci., Part B: Polym. Phys. · 2015 · 53 · 2210.1002/polb.23601 ↗
49. Laidlaw · Chem. Commun. · 2021 · 57 · 991410.1039/D1CC02918E ↗
50. Wan · Adv. Opt. Mater. · 2021 · 9 · 210006610.1002/adom.202100066 ↗
51. Pérez · Rev. Sci. Instrum. · 2022 · 93 · 03490210.1063/5.0066166 ↗