journal article·2013

High performance amorphous ZnMgO/carbon nanotube composite thin-film transistors with a tunable threshold voltage

Xingqiang Liu, Wei Liu, Xiangheng Xiao, Chunlan Wang, Zhiyong Fan, Yongquan Qu, Bo Cai, Shishang Guo, Jinchai Li, Changzhong Jiang, Xiangfeng Duan, Lei Liao

Nanoscale· Volume 5· Issue 7
Publisher page

Abstract

Here we report the fabrication and characterization of high mobility amorphous ZnMgO/single-walled carbon nanotube composite thin film transistors (TFTs) with a tunable threshold voltage. By controlling the ratio of MgO, ZnO and carbon nanotubes, high performance composite TFTs can be obtained with a field-effect mobility of up to 135 cm(2) V(-1) s(-1), a low threshold voltage of 1 V and a subthreshold swing as small as 200 mV per decade, making it a promising new solution-processed material for high performance functional circuits. A low voltage inverter is demonstrated with a functional frequency exceeding 5 kHz, which is only limited by parasitic capacitance rather than the intrinsic material speed. The overall device performance of the composite TFTs greatly surpasses not only that of the solution-processed TFTs, but also that of the conventional amorphous or polycrystalline silicon TFTs. It therefore has the potential to open up a new avenue to high-performance, solution-processed flexible electronics which could significantly impact the existing applications, and enable a whole new generation of flexible, wearable, or disposable electronics.
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Research context

OpenAlex topics: Thin-Film Transistor Technologies · ZnO doping and properties · Transition Metal Oxide Nanomaterials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (45)

Show source-provided references
1. Martins · J. Appl. Phys. · 2007 · 101 · 04450510.1063/1.2495754 ↗
2. Dehuff · J. Appl. Phys. · 2005 · 97 · 06450510.1063/1.1862767 ↗
3. Theissmann · Thin Solid Films · 2011 · 519 · 562310.1016/j.tsf.2011.02.073 ↗
4. Chen · Thin Solid Films · 2012 · 520 · 668110.1016/j.tsf.2012.06.066 ↗
5. Choi · Solid State Commun. · 2011 · 152 · 34510.1016/j.ssc.2011.12.019 ↗
6. Kim · J. Am. Chem. Soc. · 2008 · 130 · 1258010.1021/ja804262z ↗
7. Francioso · Sens. Actuators, B · 2006 · 119 · 15910.1016/j.snb.2005.12.006 ↗
8. Ebata · Appl. Phys. Express · 2012 · 5 · 110210.1143/APEX.5.011102 ↗
9. Migliorato · Appl. Phys. Lett. · 2012 · 100 · 07350610.1063/1.3685705 ↗
10. Lim · Appl. Phys. Lett. · 2009 · 95 · 01210810.1063/1.3157265 ↗
11. Park · Mol. Cryst. Liq. Cryst. Sci. Technol. · 2010 · 529 · 13710.1080/15421406.2010.495892 ↗
12. Lee · Adv. Mater. · 2007 · 19 · 84310.1002/adma.200600961 ↗
13. Kim · J. Am. Chem. Soc. · 2010 · 132 · 1035210.1021/ja100615r ↗
14. Liu · Adv. Mater. · 2010 · 22 · 233310.1002/adma.200903761 ↗
15. Gadre · Appl. Phys. Lett. · 2011 · 99 · 05190110.1063/1.3619196 ↗
16. Park · Adv. Mater. · 2010 · 22 · 551210.1002/adma.201002397 ↗
17. Fortunato · Adv. Mater. · 2012 · 24 · 294510.1002/adma.201103228 ↗
18. Kim · Phys. Status Solidi A · 2010 · 207 · 167710.1002/pssa.200983742 ↗
19. Nomura · Nature · 2004 · 432 · 48810.1038/nature03090 ↗
20. Kagan · Science · 1999 · 286 · 94510.1126/science.286.5441.945 ↗
21. Liu · Nano Lett. · 2012 · 12 · 359610.1021/nl3012648 ↗
22. Javey · Nature · 2003 · 424 · 65410.1038/nature01797 ↗
23. Kumar · Appl. Phys. Lett. · 2006 · 89 · 14350110.1063/1.2357852 ↗
24. Su · IEEE Electron Device Lett. · 2010 · 31 · 68010.1109/LED.2010.2047232 ↗
25. Svensson · Nano Lett. · 2011 · 11 · 356910.1021/nl201280q ↗
26. Avis · J. Mater. Chem. · 2012 · 22 · 1741510.1039/c2jm33054g ↗
27. Umezawa · Appl. Phys. Lett. · 2008 · 93 · 22310410.1063/1.3040306 ↗
28. Wu · IEEE Trans. Electron Devices · 2007 · 54 · 285610.1109/TED.2007.907126 ↗
29. Suh · Nanotechnology · 2012 · 23 · 30520310.1088/0957-4484/23/30/305203 ↗
30. Park · IEEE Electron Device Lett. · 2012 · 33 · 80910.1109/LED.2012.2192710 ↗
31. Choi · Thin Solid Films · 2011 · 520 · 377410.1016/j.tsf.2011.10.212 ↗
32. Narasimhamurthy · Semicond. Sci. Technol. · 2011 · 26 · 07500210.1088/0268-1242/26/7/075002 ↗
33. Ishikawa · ACS Nano · 2010 · 4 · 691410.1021/nn101198u ↗
34. Kwon · Electron. Mater. Lett. · 2011 · 7 · 110.1007/s13391-011-0301-x ↗
35. Xiang · Nature · 2006 · 441 · 48910.1038/nature04796 ↗
36. Wang · Appl. Phys. Lett. · 2006 · 88 · 13350810.1063/1.2190445 ↗
37. Wang · Appl. Phys. Lett. · 2006 · 88 · 13350810.1063/1.2190445 ↗
38. Banger · Nat. Mater. · 2010 · 10 · 4510.1038/nmat2914 ↗
39. Ding · Appl. Phys. Lett. · 2012 · 100 · 26311610.1063/1.4731776 ↗
40. Yoon · J. Am. Chem. Soc. · 2005 · 127 · 1038810.1021/ja052488f ↗
41. Oh · J. Appl. Phys. · 2007 · 102 · 07610410.1063/1.2785852 ↗
42. Sakurai · IEEE J. Solid-State Circuits · 1990 · 25 · 58410.1109/4.52187 ↗
43. Enoki · IEEE Electron Device Lett. · 1990 · 11 · 50210.1109/55.63013 ↗
44. Reddy · Microelectron. Reliab. · 2005 · 45 · 3110.1016/j.microrel.2004.05.023 ↗
45. Liu · Adv. Mater. · 2012 · 24 · 363310.1002/adma.201200906 ↗