journal article·2026-03-25

Asymmetric Polarization in FE/AFE Bilayer HZO Memcapacitors via Composition-Induced Built-in Bias

Junseok Kim, Huiseong Shin, Hyeonjung Park, Changwoo Han, Myeongjae Choi, Changhwan Shin

ACS Applied Materials & Interfaces· Volume 18· Issue 11
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Abstract

(HZO) memcapacitor was fabricated to investigate asymmetric polarization and capacitance modulation governed by a built-in bias arising from the compositional gradient. This built-in bias facilitates polarization switching under negative bias while significantly suppressing forward switching under positive bias. Furthermore, it stabilizes the negatively poled state, leading to delayed relaxation and forming a wide capacitance memory window. Comparative AC and pulse analyses revealed the coexistence of a fast dipole component and a slow trapped-charge component. The AC read exhibited nonvolatile characteristics, while the pulse read showed volatile behavior with time-dependent charge decay. These differences explain the distinct retention and nondestructive read-out (NDRO) behaviors depending on the measurement scheme. The device demonstrated symmetric, highly linear long-term potentiation and depression, confirming its potential as a synaptic element for next-generation neuromorphic computing.
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Research context

OpenAlex topics: Ferroelectric and Negative Capacitance Devices · Advanced Memory and Neural Computing · 2D Materials and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

School of Electrical Engineering, College of Engineering

Korea University

Department of Electrical and Computer Engineering

Sungkyunkwan University

School of Semiconductor System Engineering, College of Engineering

Funding

National Research Foundation of Korea · Ministry of Trade, Industry and Energy

References (27)

Show source-provided references
1. 10.1038/s42254-020-0208-210.1038/s42254-020-0208-2 ↗
2. 10.1038/ncomms528910.1038/ncomms5289 ↗
3. 10.1103/physrevb.72.12534110.1103/physrevb.72.125341 ↗
4. Hur J. · Adv. Intell. Syst. · 2022 · 4 · 210025810.1002/aisy.202100258 ↗
5. Luo Y.-C. · Proc. IEEE Int. Electron Devices Meet. (IEDM) · 2021 · 1
6. 10.1038/s41598-024-59298-810.1038/s41598-024-59298-8 ↗
7. 10.1016/j.nanoen.2025.11101110.1016/j.nanoen.2025.111011 ↗
8. 10.1007/s42114-025-01364-410.1007/s42114-025-01364-4 ↗
9. 10.1021/acsami.2c0869110.1021/acsami.2c08691 ↗
10. 10.1021/acsaelm.1c0110510.1021/acsaelm.1c01105 ↗
11. 10.1021/acsami.8b1557610.1021/acsami.8b15576 ↗
12. 10.1021/acsaelm.3c0033610.1021/acsaelm.3c00336 ↗
13. 10.1002/aelm.20210066210.1002/aelm.202100662 ↗
14. 10.1021/acsami.5b0577310.1021/acsami.5b05773 ↗
15. Pike C. R. · Phys. Earth Planet. Inter. · 2001 · 126 · 1110.1016/S0031-9201(01)00241-2 ↗
16. 10.1002/adfm.20241418710.1002/adfm.202414187 ↗
17. 10.1038/s41467-024-55411-710.1038/s41467-024-55411-7 ↗
18. Mukherjee S. · Proc. IEEE Int. Electron Devices Meet. (IEDM) · 2023 · 1
19. 10.1109/TED.2020.301579410.1109/TED.2020.3015794 ↗
20. Endo K. · Proc. IEEE Int. Conf. Dielectr. (ICD) · 2022 · 1
21. 10.1021/acs.nanolett.1c0318210.1021/acs.nanolett.1c03182 ↗
22. 10.1002/admt.20230139010.1002/admt.202301390 ↗
23. 10.1016/j.nanoen.2024.10995810.1016/j.nanoen.2024.109958 ↗
24. 10.1063/5.016476210.1063/5.0164762 ↗
25. 10.1002/adma.20230560910.1002/adma.202305609 ↗
26. 10.1186/1471-2288-14-1410.1186/1471-2288-14-14 ↗
27. 10.3390/s2211408710.3390/s22114087 ↗