Asymmetric Polarization in FE/AFE Bilayer HZO Memcapacitors via Composition-Induced Built-in Bias
Source abstract
Abstract
(HZO) memcapacitor was fabricated to investigate asymmetric polarization and capacitance modulation governed by a built-in bias arising from the compositional gradient. This built-in bias facilitates polarization switching under negative bias while significantly suppressing forward switching under positive bias. Furthermore, it stabilizes the negatively poled state, leading to delayed relaxation and forming a wide capacitance memory window. Comparative AC and pulse analyses revealed the coexistence of a fast dipole component and a slow trapped-charge component. The AC read exhibited nonvolatile characteristics, while the pulse read showed volatile behavior with time-dependent charge decay. These differences explain the distinct retention and nondestructive read-out (NDRO) behaviors depending on the measurement scheme. The device demonstrated symmetric, highly linear long-term potentiation and depression, confirming its potential as a synaptic element for next-generation neuromorphic computing.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Ferroelectric and Negative Capacitance Devices · Advanced Memory and Neural Computing · 2D Materials and Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
School of Electrical Engineering, College of Engineering
Korea University
Department of Electrical and Computer Engineering
Sungkyunkwan University
School of Semiconductor System Engineering, College of Engineering
Funding
National Research Foundation of Korea · Ministry of Trade, Industry and Energy
References (27)
Show source-provided references
1. 10.1038/s42254-020-0208-210.1038/s42254-020-0208-2 ↗
2. 10.1038/ncomms528910.1038/ncomms5289 ↗
3. 10.1103/physrevb.72.12534110.1103/physrevb.72.125341 ↗
4. Hur J. · Adv. Intell. Syst. · 2022 · 4 · 210025810.1002/aisy.202100258 ↗
5. Luo Y.-C. · Proc. IEEE Int. Electron Devices Meet. (IEDM) · 2021 · 1
6. 10.1038/s41598-024-59298-810.1038/s41598-024-59298-8 ↗
7. 10.1016/j.nanoen.2025.11101110.1016/j.nanoen.2025.111011 ↗
8. 10.1007/s42114-025-01364-410.1007/s42114-025-01364-4 ↗
9. 10.1021/acsami.2c0869110.1021/acsami.2c08691 ↗
10. 10.1021/acsaelm.1c0110510.1021/acsaelm.1c01105 ↗
11. 10.1021/acsami.8b1557610.1021/acsami.8b15576 ↗
12. 10.1021/acsaelm.3c0033610.1021/acsaelm.3c00336 ↗
13. 10.1002/aelm.20210066210.1002/aelm.202100662 ↗
14. 10.1021/acsami.5b0577310.1021/acsami.5b05773 ↗
15. Pike C. R. · Phys. Earth Planet. Inter. · 2001 · 126 · 1110.1016/S0031-9201(01)00241-2 ↗
16. 10.1002/adfm.20241418710.1002/adfm.202414187 ↗
17. 10.1038/s41467-024-55411-710.1038/s41467-024-55411-7 ↗
18. Mukherjee S. · Proc. IEEE Int. Electron Devices Meet. (IEDM) · 2023 · 1
19. 10.1109/TED.2020.301579410.1109/TED.2020.3015794 ↗
20. Endo K. · Proc. IEEE Int. Conf. Dielectr. (ICD) · 2022 · 1
21. 10.1021/acs.nanolett.1c0318210.1021/acs.nanolett.1c03182 ↗
22. 10.1002/admt.20230139010.1002/admt.202301390 ↗
23. 10.1016/j.nanoen.2024.10995810.1016/j.nanoen.2024.109958 ↗
24. 10.1063/5.016476210.1063/5.0164762 ↗
25. 10.1002/adma.20230560910.1002/adma.202305609 ↗
26. 10.1186/1471-2288-14-1410.1186/1471-2288-14-14 ↗
27. 10.3390/s2211408710.3390/s22114087 ↗