Preferential Fabrication of V2 Silicon Vacancies in 4H-SiC toward Room-Temperature Quantum Magnetic Sensing
Source abstract
Abstract
The deterministic fabrication of silicon vacancy centers with localized precision and well-defined lattice orientation is a critical prerequisite for enabling quantum applications of color centers and for advancing integrated quantum technologies. In 4H-SiC, silicon vacancies can exist in two distinct orientations due to the symmetry of the lattice environment, V1 and V2; however, targeted positioning and preferential creation of these orientations have been rarely explored. Here, we demonstrate a 10-fold enhancement in the concentration of V2 centers by combining femtosecond laser writing with an unconventional crystal plane cutting strategy, achieving high spatial accuracy on the surface of 4H-SiC. A theoretical analysis based on the differences in electronic effective mass among crystallographic planes reveals distinct ionization mechanisms under laser irradiation, which are further inferred to be a potential cause of the selective generation of defects. Based on the resulting V2 ensembles, we realize room-temperature vector magnetometry for weak magnetic fields, with an optimized detection sensitivity of 32 μT / Hz . Our results represent a significant step toward orientation-specific and site-controlled fabrication of silicon vacancies, establishing a foundational platform for their deployment in quantum sensing and quantum information processing.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Silicon Carbide Semiconductor Technologies · Diamond and Carbon-based Materials Research · Thin-Film Transistor Technologies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Key Laboratory of Laser and Infrared System Ministry of Education, Shandong University
Liaocheng Science and Technology Development Promotion Center
Center for Optics Research and Engineering, Shandong University
Funding
Key Technologies Research and Development Program
References (27)
Show source-provided references
1. 10.1039/D4TC03000A10.1039/D4TC03000A ↗
2. 10.1021/acs.nanolett.3c0390510.1021/acs.nanolett.3c03905 ↗
3. 10.1038/s41598-021-82832-x10.1038/s41598-021-82832-x ↗
4. 10.1021/acs.nanolett.4c0216210.1021/acs.nanolett.4c02162 ↗
5. 10.1016/j.optlastec.2025.11266110.1016/j.optlastec.2025.112661 ↗
6. 10.1103/PhysRevApplied.6.01401910.1103/PhysRevApplied.6.014019 ↗
7. 10.1021/acsphotonics.4c0227010.1021/acsphotonics.4c02270 ↗
8. 10.1002/lpor.20210002910.1002/lpor.202100029 ↗
9. 10.1063/5.025673210.1063/5.0256732 ↗
10. 10.1039/D5TC00336A10.1039/D5TC00336A ↗
11. 10.1016/j.ceramint.2021.01.18810.1016/j.ceramint.2021.01.188 ↗
12. 10.1364/OL.43.00607710.1364/OL.43.006077 ↗
13. 10.1021/acs.nanolett.8b0507010.1021/acs.nanolett.8b05070 ↗
14. 10.1364/OL.42.00129710.1364/OL.42.001297 ↗
15. 10.1016/j.ceramint.2024.10.02110.1016/j.ceramint.2024.10.021 ↗
16. 10.1038/s41563-023-01544-x10.1038/s41563-023-01544-x ↗
17. 10.1021/acs.nanolett.5c0132510.1021/acs.nanolett.5c01325 ↗
18. 10.1038/nmat380610.1038/nmat3806 ↗
19. 10.1063/1.11357610.1063/1.113576 ↗
20. 10.1093/nsr/nwab12210.1093/nsr/nwab122 ↗
21. 10.1021/acs.nanolett.6b0539510.1021/acs.nanolett.6b05395 ↗
22. 10.1126/sciadv.abm591210.1126/sciadv.abm5912 ↗
23. 10.1103/PhysRevB.101.06410210.1103/PhysRevB.101.064102 ↗
24. 10.1364/OL.47630510.1364/OL.476305 ↗
25. 10.48550/ARXIV.2512.0223510.48550/ARXIV.2512.02235 ↗
26. 10.1103/PhysRevApplied.19.04408610.1103/PhysRevApplied.19.044086 ↗
27. 10.1021/acs.nanolett.6b0530410.1021/acs.nanolett.6b05304 ↗