Structural and Optical Characterization of ZnO/MgxZn1–xO Multiple Quantum Wells Based Random Laser Diodes
Source abstract
Abstract
Two kinds of laser diodes (LDs) comprised of ZnO/Mg(x)Zn(1-x)O (ZnO/MZO) multiple quantum wells (MQWs) grown on GaN (MQWs/GaN) and Si (MQWs/Si) substrates, respectively, have been constructed. The LD with MQWs/GaN exhibits ultraviolet random lasing under electrical excitation, while that with MQWs/Si does not. In the MQWs/Si, ZnO/MZO MQWs consist of nanoscaled crystallites, and the MZO layers undergo a phase separation of cubic MgO and hexagonal ZnO. Moreover, the Mg atom predominantly locates in the MZO layers along with a significant aggregation at the ZnO/MZO interfaces; in sharp contrast, the ZnO/MZO MQWs in the MQWs/GaN show a well-crystallized structure with epitaxial relationships among GaN, MZO, and ZnO. Notably, Mg is observed to diffuse into the ZnO well layers. The structure-optical property relationship of these two LDs is further discussed.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: ZnO doping and properties · Random lasers and scattering media · Quantum Dots Synthesis And Properties
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
School of Physics and Technology, Center for Electron Microscopy and MOE Key Laboratory of Artificial Micro- and Nano-structures, Wuhan University, Wuhan 430072, People’s Republic of China
Department of Electronic Science & Technology, School of Physics and Technology and MOE Key Laboratory of Artificial Micro- and Nano-structures, Wuhan University, Wuhan 430072, People’s Republic of China
References (19)
Show source-provided references
1. Özgür U. · Appl. Phys. · 2005 · 98 · 041301.10.1063/1.1992666 ↗
2. Service R. F. · Science · 1997 · 276 · 89510.1126/science.276.5314.895 ↗
3. Chen N. B. · Mater. Sci. Eng., B · 2006 · 126 · 1610.1016/j.mseb.2005.08.112 ↗
4. Sarver J. F. · Electrochem. Soc. · 1959 · 106 · 96010.1149/1.2427190 ↗
5. Ohtomo A. · Appl. Phys. Lett. · 1999 · 75 · 408810.1063/1.125545 ↗
6. Park W. I. · Appl. Phys. Lett. · 2001 · 79 · 202210.1063/1.1405811 ↗
7. Ohtomo A. · Appl. Phys. Lett. · 1998 · 72 · 246610.1063/1.121384 ↗
8. Bhattacharya P. · Appl. Phys. Lett. · 2003 · 83 · 201010.1063/1.1609250 ↗
9. Zhu J. · Appl. Phys. Lett. · 2007 · 90 · 21190910.1063/1.2742574 ↗
10. Long H. · IEEE Electron Device Lett. · 2011 · 32 · 5410.1109/LED.2010.2089424 ↗
11. Park W. I. · Adv. Mater. · 2003 · 15 · 52610.1002/adma.200390122 ↗
12. Sun H. D. · Appl. Phys. Lett. · 2001 · 78 · 338510.1063/1.1375830 ↗
13. Sun H. · Nanotechnology · 2006 · 17 · 227110.1088/0957-4484/17/9/033 ↗
14. Choy J. H. · Adv. Mater. · 2003 · 15 · 191110.1002/adma.200305327 ↗
15. Jiang X. · Appl. Phys. Lett. · 2002 · 80 · 309010.1063/1.1473683 ↗
16. Pennycook S. J. · Ultramicroscopy · 1991 · 37 · 1410.1016/0304-3991(91)90004-P ↗
17. Fang G. J. · Phys. Status Solidi A · 2003 · 200 · 36110.1002/pssa.200306676 ↗
18. Shannon R. · Acta Crystallogr. A · 1976 · 32 · 75110.1107/S0567739476001551 ↗
19. Ma X. · Opt. Express · 2009 · 17 · 1442610.1364/OE.17.014426 ↗