Controlling Nucleation Sites for Metal Oxide Film Growth on Glassy Carbon via Electrochemical Preoxidation

Coating electrode materials with metal oxide thin films can improve the performance of electrocatalysts and charge storage materials. Atomic layer deposition (ALD) enables the deposition of conformal, uniform films on a wide range of electrodes; however, an even film depends on the availability of nucleation sites directly on the electrode surface. Here, we show that the electrochemical oxidation of glassy carbon electrodes prior to the deposition of alumina thin films by ALD leads to more uniform electrochemically passivating films. Cyclic voltammetry (CV), X-ray photoelectron spectroscopy (XPS), and scanning electron microscopy (SEM) demonstrate that film uniformity increases with the increasing potential of preoxidation until 2.50 V versus Ag/AgCl, at which point the films are fully passivating and appear continuous by SEM. Further increasing the potential of preoxidation leads to uniform but less consistently passivating alumina films. These findings show that electrochemical preoxidation is a rapid and readily tunable strategy for controlling oxygenic nucleation sites and therefore the growth of thin metal oxide films on glassy carbon electrodes.