journal article·2023-05-10Open access

Determining the Proximity Effect-Induced Magnetic Moment in Graphene by Polarized Neutron Reflectivity and X-ray Magnetic Circular Dichroism

Razan O. M. Aboljadayel, Christy J. Kinane, Carlos A. F. Vaz, David M. Love, Robert S. Weatherup, Philipp Braeuninger-Weimer, Marie-Blandine Martin, Adrian Ionescu, Andrew J. Caruana, Timothy R. Charlton, Justin Llandro, Pedro M. S. Monteiro, Crispin H. W. Barnes, Stephan Hofmann, Sean Langridge

ACS Applied Materials & Interfaces· Volume 15· Issue 18

Abstract

High Resolution Image Download MS PowerPoint Slide We report the magnitude of the induced magnetic moment in CVD-grown epitaxial and rotated-domain graphene in proximity with a ferromagnetic Ni film, using polarized neutron reflectivity (PNR) and X-ray magnetic circular dichroism (XMCD). The XMCD spectra at the C K -edge confirm the presence of a magnetic signal in the graphene layer, and the sum rules give a magnetic moment of up to ∼0.47 μ B /C atom induced in the graphene layer. For a more precise estimation, we conducted PNR measurements. The PNR results indicate an induced magnetic moment of ∼0.41 μ B /C atom at 10 K for epitaxial and rotated-domain graphene. Additional PNR measurements on graphene grown on a nonmagnetic Ni 9 Mo 1 substrate, where no magnetic moment in graphene is measured, suggest that the origin of the induced magnetic moment is due to the opening of the graphene’s Dirac cone as a result of the strong C p z -Ni 3d hybridization.
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Research context

OpenAlex topics: Graphene research and applications · Quantum and electron transport phenomena · Magnetic properties of thin films

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Cavendish Laboratory, Physics Department, University of Cambridge, Cambridge CB3 0HE, United Kingdom

ISIS Facility, STFC Rutherford Appleton Laboratory, Harwell Science and Innovation Campus, Oxon OX11 0QX, United Kingdom

Swiss Light Source, Paul Scherrer Institut, Villigen PSI 5232, Switzerland

Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom

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