Versatile Wafer-Scale Technique for the Formation of Ultrasmooth and Thickness-Controlled Graphene Oxide Films Based on Very Large Flakes

We present a new strategy to form thickness-adjusted and ultrasmooth films of very large and unwrinkled graphene oxide (GO) flakes through the transfer of both hemispherical and vertical water films stabilized by surfactants. With its versatility in terms of substrate type (including flexible organic substrates) and in terms of flake density (from isolated flakes to continuous and multilayer films), this wafer-scale assembly technique is adapted to a broad range of experiments involving GO and rGO (reduced graphene oxide). We illustrate its use through the evaluation of transparent rGO electrodes.