Influence of the 316 L Stainless Steel Interface on the Stability and Barrier Properties of Plasma Fluorocarbon Films
Source abstract
Abstract
Coatings are known to be one of the more suited strategies to tailor the interface between medical devices and the surrounding cells and tissues once implanted. The development of coatings and the optimization of their adhesion and stability are of major importance. In this work, the influence of plasma etching of the substrate on a plasma fluorocarbon ultrathin coating has been investigated with the aim of improving the stability and the corrosion properties of coated medical devices. The 316 L stainless steel interface was subjected to two different etching sequences prior to the plasma deposition. These plasma etchings, with H(2) and C(2)F(6) as gas precursors, modified the chemical composition and the thickness of the oxide layer and influenced the subsequent polymerization. The coating properties were evaluated using flat substrates submitted to deformation, aging into aqueous medium and corrosion tests. X-ray photoelectron spectroscopy (XPS), time of flight-secondary ion mass spectrometry (ToF-SIMS), ellipsometry, and atomic force microscopy (AFM) were performed to determine the effects of the deformation and the aging on the chemistry and morphology of the coated samples. Analyses showed that plasma etchings were essential to promote reproducible polymerization and film growth. However, the oxide layer thinning due to the etching lowered the corrosion resistance of the substrate and affected the stability of the interface. Still, the deformed samples did not exhibited adhesion and cohesion failure before and after the aging.
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OpenAlex topics: Genetic and phenotypic traits in livestock · Effects of Environmental Stressors on Livestock · Ruminant Nutrition and Digestive Physiology
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Affiliations
Laboratory for Biomaterials and Bioengineering, Department of Materials Engineering & University Hospital Research Center, Laval University, Quebec City, QC, G1K 7P4, Canada
Laboratoire de Génie des Procédés Plasmas et Traitement de Surfaces, Université Pierre et Marie Curie, ENSCP, 11 rue Pierre et Marie Curie, 75005 Paris, France
Laboratoire Interdisciplinaire de Spectroscopie Electronique, FUNDP - University of Namur, 61 Rue de Bruxelles, B-5000 Namur, Belgium
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