journal article·2026-04-29Open access

Facile Strategy Enabling Fluorine-Free Polyimides with Ultralow Dielectric Loss and Thermal Expansion Close to Copper

Yu-Hsin Liu, Dula Daksa Ejeta, Yi-Hsin Chang, Wan-Ling Hsiao, Kamani Sudhir K. Reddy, Ching-Hsuan Lin

ACS Applied Materials & Interfaces· Volume 18· Issue 16

Abstract

High Resolution Image Download MS PowerPoint Slide Polymer dielectrics for emerging high-speed interconnects must unite a low dielectric constant ( D k ) with an ultralow dissipation factor ( D f ) while retaining excellent thermal and mechanical robustness. We report a fluorine-free, linear-backbone strategy that pairs an ester-type dianhydride, 1,4-phenylene bis(1,3-dioxo-1,3-dihydroisobenzofuran-5-carboxylate) (TAHQ), with biphenyl diamines to access ester–ether copolyimides via solution polycondensation and thermal imidization. The homopolyimides from m-tolidine/TAHQ (PI-0) and 3,4-ODA/TAHQ (PI-1) establish that 3,4-ODA is intrinsically favorable for reducing high-frequency loss; building on this, we incorporate 3,4-ODA into the m-tolidine/TAHQ system to obtain copolyimides PI-X (X = mole fraction of 3,4-ODA in the diamine feed). At 10 GHz, the PI-X films achieve D f down to 0.0013 with D k around 3.1–3.4, giving D f × √ D k values of 0.0024–0.0030 that are lower than those of both parent homopolyimides. The PI-X series also exhibits reduced in-plane coefficients of thermal expansion (CTE). The minimum CTE reaches 11.8 ± 2.8 ppm/°C ( n = 4), while PI-0.625 shows a CTE of 17.2 ± 1.6 ppm/°C ( n = 4), which closely matches that of copper (∼17 ppm/°C). This close CTE match is beneficial for mitigating interfacial stress, warpage, and reliability issues in copper-clad laminates and related devices. Without resorting to complex monomer design or multistep diamine syntheses, simple copolymerization with 3,4-ODA simultaneously suppresses high-frequency dielectric loss and lowers CTE, while preserving outstanding thermomechanical performance ( T d5% = 485–500 °C; tensile strength = 68–157 MPa). These results position TAHQ-based, fluorine-free ester–ether copolyimides incorporating 3,4-ODA and m-tolidine as practical ultralow-loss dielectrics with copper-matched CTEs for high-frequency electronic hardware.
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Research context

OpenAlex topics: Synthesis and properties of polymers · Dielectric materials and actuators · Tribology and Wear Analysis

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Chemical Engineering

National Chung Hsing University

Funding

Ministry of Education of the People's Republic of China · National Science and Technology Council

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