journal article·2025-09-03Open access

Binary B–Te Selectors Reinvented: Confined Conductive Paths Unlock Superior Ovonic Threshold Switching

Hoedon Kwon, Kwangsik Jeong, Yeonwoo Seong, Gihyeon Kwon, Hyeon-Sik Kim, Hyeonwook Lim, Changwoo Lee, Dajung Kim, Hojun Lee, Mann-Ho Cho

ACS Applied Materials & Interfaces· Volume 17· Issue 35

Abstract

While Te-based ovonic threshold switching (OTS) materials offer advantages such as low-voltage operation and fast switching speed, their relatively low crystallization temperature compared to S- or Se-based counterparts results in poor thermal stability and limited electrical endurance. Various strategies, including element doping and complex composition design, have been explored to address these limitations. In this study, the OTS device properties of B x Te thin films, a simple two-component system, were systematically investigated across a wide range of compositions. Electrical measurements, band structure analysis, and bonding configuration studies revealed that increasing the boron content enhanced the insulating properties in the off-state and improved the thermal stability of the films. Through composition optimization, B x Te devices exhibited significantly lower off-current densities while maintaining excellent switching characteristics, outperforming previously reported Te-based OTS materials. Furthermore, detailed analysis confirmed that the unique bonding configurations and structural features associated with boron incorporation play a critical role in achieving the outperformances in B x Te devices.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Phase-change materials and chalcogenides · Advanced Memory and Neural Computing · Transition Metal Oxide Nanomaterials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Physics

Yonsei University

Division of AI Semiconductor

Department of Chemistry and Biochemistry

University of California

Department of System Semiconductor Engineering

Funding

Ministry of Science and ICT, South Korea

References (53)

Show source-provided references
1. 10.1109/JPROC.2017.273177610.1109/JPROC.2017.2731776 ↗
2. Wang, Z.; Nalla, P. S.; Krishnan, G.; Joshi, R. V.; Cady, N. C.; Fan, D.; Seo, J. S.; Cao, Y. Digital-Assisted Analog In-Memory Computing with RRAM Devices. Proc. 2023 Int. VLSI Symp. Technol. Syst. Appl. 2023, 1, 1–4.10.1109/VLSI-TSA/VLSI-DAT57221.2023.10134272.10.1109/VLSI-TSA/VLSI-DAT57221.2023.10134272 ↗
3. 10.1038/srep4237510.1038/srep42375 ↗
4. 10.1038/s41598-017-08251-z10.1038/s41598-017-08251-z ↗
5. 10.1088/1361-6528/aac9f510.1088/1361-6528/aac9f5 ↗
6. 10.1109/LED.2017.268543510.1109/LED.2017.2685435 ↗
7. 10.1109/VLSIT.2018.851068110.1109/VLSIT.2018.8510681 ↗
8. 10.1109/LED.2021.306485710.1109/LED.2021.3064857 ↗
9. 10.7567/1882-0786/ab2cd910.7567/1882-0786/ab2cd9 ↗
10. 10.1149/2.011309ssl10.1149/2.011309ssl ↗
11. 10.1007/s00339-019-3073-z10.1007/s00339-019-3073-z ↗
12. 10.1038/s41467-020-18382-z10.1038/s41467-020-18382-z ↗
13. 10.1016/j.jallcom.2022.16740910.1016/j.jallcom.2022.167409 ↗
14. 10.1038/s41467-023-41643-610.1038/s41467-023-41643-6 ↗
15. 10.1016/j.vacuum.2025.11433910.1016/j.vacuum.2025.114339 ↗
16. 10.1109/TED.2024.342377210.1109/TED.2024.3423772 ↗
17. 10.1063/1.494536710.1063/1.4945367 ↗
18. 10.1109/TED.2018.287363810.1109/TED.2018.2873638 ↗
19. 10.1109/IMW.2016.749529310.1109/IMW.2016.7495293 ↗
20. 10.1088/0268-1242/29/10/10400510.1088/0268-1242/29/10/104005 ↗
21. Woo, J.; Song, J.; Moon, K.; Lee, J. H.; Cha, E.; Prakash, A.; Lee, D.; Lee, S.; Park, J.; Koo, Y.; Park, C. G.; Hwang, H. Electrical and reliability characteristics of a scaled (∼30nm) tunnel barrier selector (W/Ta2O5/TaOx/TiO2/TiN) with excellent performance (JMAX > 107A/cm2). Dig. Technol. Pap.─Symp. VLSI Technol. 2014, 1.10.1109/VLSIT.2014.6894431.10.1109/VLSIT.2014.6894431 ↗
22. 10.1002/advs.20200225110.1002/advs.202002251 ↗
23. 10.1109/JEDS.2018.283640010.1109/JEDS.2018.2836400 ↗
24. 10.1016/j.jallcom.2022.16517610.1016/j.jallcom.2022.165176 ↗
25. 10.1007/s40820-023-01289-x10.1007/s40820-023-01289-x ↗
26. Chekol, S. A.; Yoo, J.; Hwang, H. Thermally Stable Te-based Binary OTS Device for Selector Application. NVMTS 2018 - Non-Volatile Mem. Technol. Symp. 2018, 1–4.10.1109/NVMTS.2018.8603103.10.1109/NVMTS.2018.8603103 ↗
27. 10.1063/1.277368810.1063/1.2773688 ↗
28. 10.1103/PhysRevB.78.03530810.1103/PhysRevB.78.035308 ↗
29. 10.1038/s41467-022-29054-510.1038/s41467-022-29054-5 ↗
30. 10.1126/sciadv.aay283010.1126/sciadv.aay2830 ↗
31. 10.1002/aelm.20190019610.1002/aelm.201900196 ↗
32. 10.1063/1.512691310.1063/1.5126913 ↗
33. 10.1063/5.003484710.1063/5.0034847 ↗
34. 10.1002/pssb.1966015022410.1002/pssb.19660150224 ↗
35. 10.1038/s41598-018-30207-010.1038/s41598-018-30207-0 ↗
36. 10.1021/acs.chemmater.3c0109710.1021/acs.chemmater.3c01097 ↗
37. 10.1002/sia.74014050310.1002/sia.740140503 ↗
38. 10.1126/science.abi633210.1126/science.abi6332 ↗
39. 10.1006/jssc.1997.743010.1006/jssc.1997.7430 ↗
40. 10.1016/0038-1098(85)90213-310.1016/0038-1098(85)90213-3 ↗
41. Yoo, J.; Baek, K.; Hwang, H. Te-based amorphous binary OTS device with excellent selector characteristics for x-point memory applications. 2016 IEEE Symposium on VLSI Technology 2016, 1–2.10.1109/VLSIT.2016.7573389.10.1109/VLSIT.2016.7573389 ↗
42. 10.1002/aelm.20240088110.1002/aelm.202400881 ↗
43. 10.1109/LED.2022.315220710.1109/LED.2022.3152207 ↗
44. 10.1016/j.apsusc.2020.14581510.1016/j.apsusc.2020.145815 ↗
45. 10.1063/1.512521510.1063/1.5125215 ↗
46. 10.1002/adfm.20241546210.1002/adfm.202415462 ↗
47. 10.1109/LED.2023.329799210.1109/LED.2023.3297992 ↗
48. 10.1016/j.cclet.2022.02.08010.1016/j.cclet.2022.02.080 ↗
49. 10.1016/0927-0256(96)00008-010.1016/0927-0256(96)00008-0 ↗
50. 10.1021/acsami.8b1578410.1021/acsami.8b15784 ↗
51. 10.1103/PhysRevB.59.175810.1103/PhysRevB.59.1758 ↗
52. 10.1103/PhysRevLett.45.119610.1103/PhysRevLett.45.1196 ↗
53. 10.1063/1.240466310.1063/1.2404663 ↗