journal article·2025-04-09

Impact of Mo Barrier Layers on the Interface and Microstructure of Al/Sc Multilayers for the Extreme Ultraviolet Range

Zile Wang, Bo Lai, Zhe Zhang, Chenyuan Chang, Yanqing Wu, Li Jiang, Runze Qi, Qiushi Huang, Zhong Zhang, Zhanshan Wang

ACS Applied Materials & Interfaces· Volume 17· Issue 14
Publisher page

Abstract

Al/Sc multilayers are potential optical elements to be used for the extreme ultraviolet range at wavelengths longer than the Sc M2,3 absorption edge. The existing research exhibits a significant gap concerning the incorporation of a barrier layer within the Al/Sc multilayer to enhance interface quality. A series of Al/Sc, Al/Sc/Mo, Al/Mo/Sc, and Al/Mo/Sc/Mo multilayers were fabricated by the direct-current magnetron sputtering technique. Grazing incidence X-ray reflectivity, transmission electron microscopy, selected area electron diffraction, energy-dispersive X-ray spectroscopy, X-ray diffraction, and X-ray absorption spectroscopy were used to investigate the effect of Mo barrier layers on interface properties and layer microstructure of Al/Sc multilayers. The results indicate that Mo barrier layers with a thickness of approximately 0.5 nm at different interfaces perform different functions. The Mo barriers at Al-on-Sc interfaces primarily play a role in suppressing the columnar crystallization of Al layers, contributing to the smoothening of interfacial roughness. The thin Mo layers at Sc-on-Al interfaces mainly act as antidiffusion barriers, preventing the diffusion of Al atoms into Sc layers. A model of the impact of Mo barrier layers on the interface diffusion and microstructure of Al/Sc multilayers has been established.
Source: europepmc · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Catalytic Processes in Materials Science · nanoparticles nucleation surface interactions · Advanced Chemical Physics Studies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

MOE Key Laboratory of Advanced Micro-Structured Materials, Institute of Precision Optical Engineering (IPOE), School of Physics Science and Engineering

Tongji University

Full-Spectrum High-Performance Optical Thin Film Devices and Application Professional Technical Service Platform

Shanghai Institute of Applied Physics

Chinese Academy of Sciences

Shanghai Synchrotron Radiation Facility

Zhejiang Tongyue Optical Technology Co., Ltd.

Funding

Shanghai Collaborative Innovation Project Funding

References (48)

Show source-provided references
1. 10.1364/OME.52346310.1364/OME.523463 ↗
2. 10.1364/AO.50143710.1364/AO.501437 ↗
3. 10.3389/fspas.2021.64782810.3389/fspas.2021.647828 ↗
4. 10.1134/S106378422011017110.1134/S1063784220110171 ↗
5. 10.1134/S106378501902014710.1134/S1063785019020147 ↗
6. 10.1166/jnn.2019.1647710.1166/jnn.2019.16477 ↗
7. 10.1364/ol.38473410.1364/ol.384734 ↗
8. 10.1117/1.OE.63.9.09160410.1117/1.OE.63.9.091604 ↗
9. 10.1088/1674-4527/acee4e10.1088/1674-4527/acee4e ↗
10. Delmotte, F.; Dehlinger, M.; Bourassin-Bouchet, C.; de Rossi, S.; Jerome, A.; Meltchakov, E.; Varnière, F. Multilayer optics for coherent EUV/X-ray laser sources. X-Ray Lasers and Coherent X-Ray Sources: Development and Applications XI, 2015; Vol. 9589; p 958907.10.1117/12.2188048 ↗
11. 10.1016/j.tsf.2021.13887310.1016/j.tsf.2021.138873 ↗
12. 10.1364/ol.40052610.1364/ol.400526 ↗
13. 10.1088/1402-4896/ad451f10.1088/1402-4896/ad451f ↗
14. 10.1016/j.apsusc.2022.15574310.1016/j.apsusc.2022.155743 ↗
15. 10.1016/j.tsf.2019.01.03310.1016/j.tsf.2019.01.033 ↗
16. 10.1039/D0CP05180B10.1039/D0CP05180B ↗
17. 10.1016/j.apsusc.2022.15496110.1016/j.apsusc.2022.154961 ↗
18. 10.1021/acs.jpcc.0c0724210.1021/acs.jpcc.0c07242 ↗
19. 10.1021/acsami.0c0356310.1021/acsami.0c03563 ↗
20. 10.1107/s160057752001342910.1107/s1600577520013429 ↗
21. 10.1107/S160057672400770210.1107/S1600576724007702 ↗
22. 10.1364/OE.47507910.1364/OE.475079 ↗
23. 10.3139/146.10141210.3139/146.101412 ↗
24. 10.1007/s11669-014-0340-810.1007/s11669-014-0340-8 ↗
25. 10.1098/rsta.1999.046910.1098/rsta.1999.0469 ↗
26. 10.12074/202412.0015410.12074/202412.00154 ↗
27. 10.1021/acsami.1c1759510.1021/acsami.1c17595 ↗
28. 10.1007/s40843-015-0043-410.1007/s40843-015-0043-4 ↗
29. 10.2138/rmg.2014.78.310.2138/rmg.2014.78.3 ↗
30. 10.1021/am504642210.1021/am5046422 ↗
31. 10.1107/s090904950501271910.1107/s0909049505012719 ↗
32. 10.1006/adnd.1993.101310.1006/adnd.1993.1013 ↗
33. 10.1107/S002188980704508610.1107/S0021889807045086 ↗
34. 10.1063/1.357366210.1063/1.3573662 ↗
35. 10.1016/j.surfcoat.2023.12994110.1016/j.surfcoat.2023.129941 ↗
36. 10.1017/S088571561900081210.1017/S0885715619000812 ↗
37. 10.1107/S160057671500473210.1107/S1600576715004732 ↗
38. 10.1111/j.1151-2916.1991.tb04328.x10.1111/j.1151-2916.1991.tb04328.x ↗
39. 10.1039/B604267H10.1039/B604267H ↗
40. 10.2138/am.2006.203710.2138/am.2006.2037 ↗
41. 10.1002/xrs.110310.1002/xrs.1103 ↗
42. 10.1051/metal/201107910.1051/metal/2011079 ↗
43. 10.1021/acs.inorgchem.5b0188610.1021/acs.inorgchem.5b01886 ↗
44. 10.1016/j.solidstatesciences.2018.02.01810.1016/j.solidstatesciences.2018.02.018 ↗
45. 10.1039/D3CP04108E10.1039/D3CP04108E ↗
46. 10.1039/d2cp03785h10.1039/d2cp03785h ↗
47. 10.1016/S0039-6028(98)00363-X10.1016/S0039-6028(98)00363-X ↗
48. 10.4161/biom.2887110.4161/biom.28871 ↗