High Aspect Ratio Nanoscale Pores through BCP-Based Metal Oxide Masks and Advanced Dry Etching
Source abstract
Abstract
The reliable and regular modification of the surface properties of substrates plays a crucial role in material research and the development of functional surfaces. A key aspect of this is the development of the surface pores and topographies. These can confer specific advantages such as high surface area as well as specific functions such as hydrophobic properties. Here, we introduce a combination of nanoscale self-assembled block-copolymer-based metal oxide masks with optimized deep reactive ion etching (DRIE) of silicon to permit the fabrication of porous topographies with aspect ratios of up to 50. Following the evaluation of our procedure and involved parameters using various techniques, such as AFM or SEM, the suitability of our features for applications relying on high light absorption as well as efficient thermal management is explored and discussed in further detail.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Block Copolymer Self-Assembly · Semiconductor materials and devices · Thermal properties of materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
AMBER Research Centre/School of Chemistry, Trinity College Dublin, Dublin D02 CP49, Ireland
Department of Biomedical Engineering, Lund University, Lund 22363, Sweden
Department of Mechanical and Process Engineering, ETH Zürich, Zürich 8092, Switzerland
Department of Chemical Engineering and Biotechnology, University of Cambridge, Cambridge CB3 0AS, U.K.
Funding
Eidgen?ssische Technische Hochschule Z?rich · Schweizerischer Nationalfonds zur F?rderung der Wissenschaftlichen Forschung · Science Foundation Ireland · Trinity College Dublin · University of Cambridge · SFI Research Centre for Advanced Materials and BioEngineering Research
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