Beware of Artifacts When Characterizing Nanometer Device Features Smaller than a TEM Lamella Thickness in Semiconductor Wafer-foundries
Source abstract
Abstract
Wayne Zhao, Hugh Porter, Raghaw Rai, Esther (PY) Chen, Jeremy Russell; Beware of Artifacts When Characterizing Nanometer Device Features Smaller than a TEM
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Source: openalex_inverted_index · Quality: short
Research context
OpenAlex topics: Integrated Circuits and Semiconductor Failure Analysis · Electron and X-Ray Spectroscopy Techniques · Semiconductor materials and devices
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