The Strategy of Advanced Analysis in Semiconductor Nano-Device: From Nanoprobing to Nanoscopy and Nanoanalysis
Source abstract
Abstract
As semiconductor devices shrink down to 20nm and below, the required imaging and analysis become more critical and challenging. To support the analytical purposes, the Nanoprobing (Figure We postulate the uniqueness Regarding the Nanoscopy and Nanoanalysis, we need capabilities for the dopant profiling and inspection for new materials, HKMG, and new structure, 3D FinFET. There are already plenty of references for the progress In this paper, I would emphasize on the power of Atom Probing Tomography (APT), Analytical TEM (EELS and XEDS) and Atomic resolution STEM for the further physical analysis of post-Nanoprobing. Figure Therefore, the progress of Nanoscopy and Nanoanalysis becomes valuable for the advanced Semiconductor analysis.
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Research context
OpenAlex topics: Advanced Materials Characterization Techniques · Advanced Electron Microscopy Techniques and Applications · Anodic Oxide Films and Nanostructures
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