The Low Energy X-ray Spectrometry Technique as Applied to Semiconductors
Source abstract
Abstract
We describe the recent introduction of low energy X-ray emission spectrometry as a metrology technique to control the fabrication process in the integrated circuit industry. The benefits of this particular analytical method and the wide field of potential applications are addressed.
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Research context
OpenAlex topics: X-ray Spectroscopy and Fluorescence Analysis · Electron and X-Ray Spectroscopy Techniques · Advancements in Photolithography Techniques
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References (3)
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