An Approach to Extend Electron Holography into Characterization on Dopant Profiles for FinFET of Nanometer Semiconductor Device in Wafer-foundries
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Abstract
Wayne Zhao, Travis Mitchell; An Approach to Extend Electron Holography into Characterization on Dopant Profiles for FinFET of Nanometer Semiconductor Devic
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Source: openalex_inverted_index · Quality: short
Research context
OpenAlex topics: Advancements in Semiconductor Devices and Circuit Design · Integrated Circuits and Semiconductor Failure Analysis · Semiconductor materials and devices
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References (3)
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1. 3. Thanks to John Lemon and Frieder Baumann at Fab8 for inspiring discussions, and Management and Legal teams for supporting the publication clearance.
2. Zhao · Microscopy and Microanalysis · 1490
3. 10.1016/j.ultramic.2012.08.00810.1016/j.ultramic.2012.08.008 ↗